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Christophe Detavernier
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Journal Articles

Investigation of atomic layer deposition methods of Al2O3 on n-GaN

Liad Tadmor, Sofie S. T. Vandenbroucke, Eldad Bahat Treidel, Enrico Brusaterra, Paul Plate, Nicole Volkmer, Frank Brunner, Christophe Detavernier, Joachim Würfl, Oliver Hilt
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 085701 (2024)
https://doi.org/10.1063/5.0189543
Published: February 2024
View article titled, Investigation of atomic layer deposition methods of Al<sub>2</sub>O<sub>3</sub> on <em>n</em>-GaN
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Journal Articles

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Editor’s Pick
Femi Mathew, Nithin Poonkottil, Eduardo Solano, Dirk Poelman, Zeger Hens, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 060401 (2023)
https://doi.org/10.1116/6.0002993
Published: October 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline Ga<sub>2</sub>S<sub>3</sub> thin films
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Includes: Supplementary data
Journal Articles

A step toward correct interpretation of XPS results in metal oxides: A case study aided by first-principles method in ZnO

Editor’s Pick
Jin Li, Michael Nolan, Christophe Detavernier
Journal: The Journal of Chemical Physics
J. Chem. Phys. 159, 034702 (2023)
https://doi.org/10.1063/5.0154926
Published: July 2023
View article titled, A step toward correct interpretation of XPS results in metal oxides: A case study aided by first-principles method in ZnO
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of metal phosphates

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Lowie Henderick, Arpan Dhara, Andreas Werbrouck, Jolien Dendooven, Christophe Detavernier
Journal: Applied Physics Reviews
Appl. Phys. Rev. 9, 011310 (2022)
https://doi.org/10.1063/5.0069647
Published: February 2022
View article titled, Atomic layer deposition of metal phosphates
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Journal Articles

Tuning of the thermal stability and ovonic threshold switching properties of GeSe with metallic and non-metallic alloying elements

Jonas Keukelier, Karl Opsomer, Wouter Devulder, Sergiu Clima, Ludovic Goux, Gouri Sankar Kar, Christophe Detavernier
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 165103 (2021)
https://doi.org/10.1063/5.0055861
Published: October 2021
View article titled, Tuning of the thermal stability and ovonic threshold switching properties of GeSe with metallic and non-metallic alloying elements
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062402 (2021)
https://doi.org/10.1116/6.0001094
Published: September 2021
View article titled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
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Includes: Supplementary data
Journal Articles

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

LiAo Cao, Felix Mattelaer, Timo Sajavaara, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022417 (2020)
https://doi.org/10.1116/1.5139631
Published: February 2020
View article titled, A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
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Journal Articles

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Vu Luong, Vicky Philipsen, Karl Opsomer, Jens Rip, Eric Hendrickx, Marc Heyns, Christophe Detavernier, Christian Laubis, Frank Scholze
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061607 (2019)
https://doi.org/10.1116/1.5125662
Published: November 2019
View article titled, Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
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Journal Articles

Corrosion protection of Cu by atomic layer deposition

Editor’s Pick
Véronique Cremers, Geert Rampelberg, Kitty Baert, Shoshan Abrahami, Nathalie Claes, Thais Milagres de Oliveira, Herman Terryn, Sara Bals, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060902 (2019)
https://doi.org/10.1116/1.5116136
Published: September 2019
View article titled, Corrosion protection of Cu by atomic layer deposition
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Journal Articles

Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2

Editor’s Pick
Jeroen Kint, Felix Mattelaer, Matthias Minjauw, Bo Zhao, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 050904 (2019)
https://doi.org/10.1116/1.5115987
Published: August 2019
View article titled, Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe<sub>2</sub>O<sub>3</sub>-SnO<sub>2</sub>
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Journal Articles

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Fatemeh S. M. Hashemi, LiAo Cao, Felix Mattelaer, Timo Sajavaara, J. Ruud van Ommen, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 040901 (2019)
https://doi.org/10.1116/1.5093402
Published: July 2019
View article titled, Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
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Includes: Supplementary data
Journal Articles

Plasma enhanced atomic layer deposition of gallium sulfide thin films

Editor’s Pick
Jakob Kuhs, Zeger Hens, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020915 (2019)
https://doi.org/10.1116/1.5079553
Published: January 2019
View article titled, Plasma enhanced atomic layer deposition of gallium sulfide thin films
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Journal Articles

ALD assisted nanoplasmonic slot waveguide for on-chip enhanced Raman spectroscopy

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Ali Raza, Stéphane Clemmen, Pieter Wuytens, Muhammad Muneeb, Michiel Van Daele, Jolien Dendooven, Christophe Detavernier, Andre Skirtach, Roel Baets
Journal: APL Photonics
APL Photonics 3, 116105 (2018)
https://doi.org/10.1063/1.5048266
Published: October 2018
View article titled, ALD assisted nanoplasmonic slot waveguide for on-chip enhanced Raman spectroscopy
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Includes: Supplementary data
Journal Articles

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Violeta Prodanovic´, Hong Wah Chan, Anil U. Mane, Jeffrey W. Elam, Matthias M. Minjauw, Christophe Detavernier, Harry van der Graaf, Pasqualina M. Sarro
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 06A102 (2018)
https://doi.org/10.1116/1.5040813
Published: October 2018
View article titled, Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO
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Journal Articles

Annealing of thin “Tincone” films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Kevin Van de Kerckhove, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051506 (2018)
https://doi.org/10.1116/1.5038867
Published: July 2018
View article titled, Annealing of thin “Tincone” films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres
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Journal Articles

Plasma enhanced atomic layer deposition of aluminum sulfide thin films

Editor’s Pick
Jakob Kuhs, Zeger Hens, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A113 (2018)
https://doi.org/10.1116/1.5003339
Published: December 2017
View article titled, Plasma enhanced atomic layer deposition of aluminum sulfide thin films
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Journal Articles

Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

Editor’s Pick
Thomas Dobbelaere, Felix Mattelaer, Philippe M. Vereecken, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041513 (2017)
https://doi.org/10.1116/1.4987131
Published: June 2017
View article titled, Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
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Journal Articles

Perpendicular magnetic anisotropy of CoFeB\Ta bilayers on ALD HfO2

Bart F. Vermeulen, Jackson Wu, Johan Swerts, Sebastien Couet, Iuliana P. Radu, Guido Groeseneken, Christophe Detavernier, Johanna K. Jochum, Margriet Van Bael, Kristiaan Temst, Amit Shukla, Shinji Miwa, Yoshishige Suzuki, Koen Martens
Journal: AIP Advances
Series: Magnetism and Magnetic Materials
AIP Advances 7, 055933 (2017)
https://doi.org/10.1063/1.4978007
Published: March 2017
View article titled, Perpendicular magnetic anisotropy of CoFeB\Ta bilayers on ALD HfO<sub>2</sub>
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Journal Articles

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures

Véronique Cremers, Filip Geenen, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B115 (2017)
https://doi.org/10.1116/1.4968201
Published: November 2016
View article titled, Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures
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Journal Articles

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Jolien Dendooven, Eduardo Solano, Matthias M. Minjauw, Kevin Van de Kerckhove, Alessandro Coati, Emiliano Fonda, Giuseppe Portale, Yves Garreau, Christophe Detavernier
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 87, 113905 (2016)
https://doi.org/10.1063/1.4967711
Published: November 2016
View article titled, Mobile setup for synchrotron based <em>in situ</em> characterization during thermal and plasma-enhanced atomic layer deposition
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Includes: Supplementary data