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Chin-Wook Chung
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Journal Articles

Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasma

You He, Yi-Lang Jiang, Myoung-Jae Lee, Min-Seok Kim, Beom-Jun Seo, Ju-Ho Kim, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063002 (2024)
https://doi.org/10.1116/6.0003851
Published: October 2024
View article titled, Effect of a DC gradient magnetic field on electron density in a weakly magnetized inductively coupled plasma
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Journal Articles

Ion energy distribution measurement device using a capillary plate with high-aspect ratio

Featured
Ho-Won Lee, Ju-Ho Kim, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 30, 123504 (2023)
https://doi.org/10.1063/5.0178006
Published: December 2023
View article titled, Ion energy distribution measurement device using a capillary plate with high-aspect ratio
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Journal Articles

Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas

Ho-Jun Moon, Jae-Won Lee, Ho-Won Lee, Yeong-Min Lim, Jiwon Jung, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053003 (2023)
https://doi.org/10.1116/6.0002790
Published: July 2023
View article titled, Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas
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Journal Articles

Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam

Editor’s Pick
Jiwon Jung, Min-Seok Kim, Junyoung Park, Chang-Min Lim, Tae-Wung Hwang, Beom-Jun Seo, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 30, 023504 (2023)
https://doi.org/10.1063/5.0131389
Published: February 2023
View article titled, Electron-assisted PR etching in oxygen inductively coupled plasma via a low-energy electron beam
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Journal Articles

A method for measuring electron temperature and ion density with immunity to RF fluctuation and ion current

Hyundong Eo, Kyung-Hyun Kim, Moo-Young Lee, Ju Ho Kim, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 30, 023501 (2023)
https://doi.org/10.1063/5.0099209
Published: February 2023
View article titled, A method for measuring electron temperature and ion density with immunity to RF fluctuation and ion current
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Journal Articles

Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013005 (2023)
https://doi.org/10.1116/6.0002180
Published: December 2022
View article titled, Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor
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Journal Articles

Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma

Yeong-Min Lim, So-Yeong Park, You He, Young-Hun Hong, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063003 (2022)
https://doi.org/10.1116/6.0002016
Published: October 2022
View article titled, Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma
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Journal Articles

Experimental investigation on the hysteresis in low-pressure inductively coupled neon discharge

Young-Hun Hong, Tae-Woo Kim, Ju-Ho Kim, Yeong-Min Lim, Moo-Young Lee, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 29, 093506 (2022)
https://doi.org/10.1063/5.0092091
Published: September 2022
View article titled, Experimental investigation on the hysteresis in low-pressure inductively coupled neon discharge
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Journal Articles

Effect of RF bias power on discharge mode transition and its hysteresis in inductively coupled plasmas

Aixian Zhang, Min-Seok Kim, Young-Hun Hong, Jun-Hyeon Moon, Kyung-Hyun Kim, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 29, 013510 (2022)
https://doi.org/10.1063/5.0064438
Published: January 2022
View article titled, Effect of RF bias power on discharge mode transition and its hysteresis in inductively coupled plasmas
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Journal Articles

Hysteresis control using a DC magnetic field in an argon inductively coupled plasma

Tae-Woo Kim, Moo-Young Lee, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 28, 123518 (2021)
https://doi.org/10.1063/5.0071172
Published: December 2021
View article titled, Hysteresis control using a DC magnetic field in an argon inductively coupled plasma
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Journal Articles

Response to “Comment on ‘A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma’” [Phys. Plasmas 28 , 064701 (2021)]

Young-Cheol Kim, Hyun-Jun Kim, Hyo-Chang Lee, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 28, 064702 (2021)
https://doi.org/10.1063/5.0048524
Published: June 2021
View article titled, Response to “Comment on ‘A study on improvement of discharge characteristic by using a transformer in a capacitively coupled plasma’” [Phys. Plasmas 28 , 064701 (2021)]
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Journal Articles

Experimental investigation on optimal plasma generation in inductively coupled plasma

Young-Hun Hong, Ju-Ho Kim, Tae-Woo Kim, Ho-Won Lee, Moo-Young Lee, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 28, 053507 (2021)
https://doi.org/10.1063/5.0049941
Published: May 2021
View article titled, Experimental investigation on optimal plasma generation in inductively coupled plasma
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Journal Articles

A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas

Yeong-Min Lim, Hyundong Eo, Kyung-Hyun Kim, Moo-Young Lee, Chin-Wook Chung
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 92, 053531 (2021)
https://doi.org/10.1063/5.0044115
Published: May 2021
View article titled, A wafer-like apparatus for two-dimensional measurement of plasma parameters and temperature distribution in low-temperature plasmas
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Journal Articles

Control of the spatial distribution of ion flux in dual inductively coupled plasmas

Sung-Won Cho, Jun-Hyeon Moon, Aixian Zhang, Chin-Wook Chung
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 103305 (2021)
https://doi.org/10.1063/5.0026248
Published: March 2021
View article titled, Control of the spatial distribution of ion flux in dual inductively coupled plasmas
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Journal Articles

Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma

Nayeon Lee, Ohyung Kwon, Chin-Wook Chung
Journal: AIP Advances
AIP Advances 11, 025027 (2021)
https://doi.org/10.1063/6.0000883
Published: February 2021
View article titled, Correlation of RF impedance with Ar plasma parameters in semiconductor etch equipment using inductively coupled plasma
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Journal Articles

The opposite pressure dependence of electron temperature with respect to O2/Ar mixing ratio in an inductively coupled plasma

Moo-Young Lee, Jiwon Jung, Tae-Woo Kim, Kyung-Hyun Kim, Deuk-Chul Kwon, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 27, 113504 (2020)
https://doi.org/10.1063/5.0022308
Published: November 2020
View article titled, The opposite pressure dependence of electron temperature with respect to O<sub>2</sub>/Ar mixing ratio in an inductively coupled plasma
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Journal Articles

Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge

Jiwon Jung, Moo-Young Lee, Kyung-Hyun Kim, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 27, 103506 (2020)
https://doi.org/10.1063/5.0005003
Published: October 2020
View article titled, Experimental observation of the effect of electron attachment and detachment reactions on the electron energy distribution in an inductive oxygen discharge
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Journal Articles

Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation

Kwan-Yong Kim, Kyung-Hyun Kim, Jun-Hyeon Moon, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 27, 093504 (2020)
https://doi.org/10.1063/5.0006417
Published: September 2020
View article titled, Electrical and plasma characterization of a hybrid plasma source combined with inductively coupled and capacitively coupled plasmas for O atom generation
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Journal Articles

Effect of the RF bias on the plasma density in an argon inductively coupled plasma

Ho-won Lee, Kyung-Hyun Kim, Jong In Seo, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 27, 093508 (2020)
https://doi.org/10.1063/5.0015555
Published: September 2020
View article titled, Effect of the RF bias on the plasma density in an argon inductively coupled plasma
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Journal Articles

Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma

Featured
Tae-Woo Kim, Ju-ho Kim, Moo-Young Lee, Chin-Wook Chung
Journal: Physics of Plasmas
Phys. Plasmas 27, 073505 (2020)
https://doi.org/10.1063/5.0010018
Published: July 2020
View article titled, Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma
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