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Charles R. Eddy
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Journal Articles

Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

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Jeffrey M. Woodward, Samantha G. Rosenberg, David R. Boris, Michael J. Johnson, Scott G. Walton, Scooter D. Johnson, Zachary R. Robinson, Neeraj Nepal, Karl F. Ludwig, Jr., Jennifer K. Hite, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062405 (2022)
https://doi.org/10.1116/6.0002021
Published: October 2022
View articletitled, Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]

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David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 057001 (2022)
https://doi.org/10.1116/6.0002172
Published: September 2022
View articletitled, Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]
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Journal Articles

Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD

Editor’s PickFree
David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 044002 (2022)
https://doi.org/10.1116/6.0001840
Published: July 2022
View articletitled, Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD
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Journal Articles

Assessment of the (010) β-Ga2O3 surface and substrate specification

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Michael A. Mastro, Charles R. Eddy, Jr., Marko J. Tadjer, Jennifer K. Hite, Jihyun Kim, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013408 (2021)
https://doi.org/10.1116/6.0000725
Published: December 2020
View articletitled, Assessment of the (010) β-Ga2O3 surface and substrate specification
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Journal Articles

Band offset determination for amorphous Al2O3 deposited on bulk AlN and atomic-layer epitaxial AlN on sapphire

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Chaker Fares, Fan Ren, Marko J. Tadjer, Jeffrey Woodward, Michael A. Mastro, Boris N. Feigelson, Charles R. Eddy, Jr., S. J. Pearton
Journal: Applied Physics Letters
Appl. Phys. Lett. 117, 182103 (2020)
https://doi.org/10.1063/5.0025835
Published: November 2020
View articletitled, Band offset determination for amorphous Al2O3 deposited on bulk AlN and atomic-layer epitaxial AlN on sapphire
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Journal Articles

Comprehensive characterization of copper oxide atomic layer deposition using water or ozone with enhanced bis-(dimethylamino-2-propoxide) copper delivery

Editor’s PickFree
Jason R. Avila, Charles R. Eddy, Jr., Virginia D. Wheeler
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042403 (2020)
https://doi.org/10.1116/6.0000248
Published: May 2020
View articletitled, Comprehensive characterization of copper oxide atomic layer deposition using water or ozone with enhanced bis-(dimethylamino-2-propoxide) copper delivery
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Journal Articles

Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy

Editor’s PickFree
David R. Boris, Virginia D. Wheeler, Jason R. Avila, Syed B. Qadri, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060909 (2019)
https://doi.org/10.1116/1.5128208
Published: November 2019
View articletitled, Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
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Journal Articles

Tailoring commensurability of hBN/graphene heterostructures using substrate morphology and epitaxial growth conditions

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Daniel J. Pennachio, Chance C. Ornelas-Skarin, Nathaniel S. Wilson, Samantha G. Rosenberg, Kevin M. Daniels, Rachael L. Myers-Ward, D. Kurt Gaskill, Charles R. Eddy, Jr., Christopher J. Palmstrøm
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051503 (2019)
https://doi.org/10.1116/1.5110524
Published: July 2019
View articletitled, Tailoring commensurability of hBN/graphene heterostructures using substrate morphology and epitaxial growth conditions
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Journal Articles

Thermal atomic layer etching of crystalline GaN using sequential exposures of XeF2 and BCl3

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Nicholas R. Johnson, Jennifer K. Hite, Michael A. Mastro, Charles. R. Eddy, Jr., Steven M. George
Journal: Applied Physics Letters
Appl. Phys. Lett. 114, 243103 (2019)
https://doi.org/10.1063/1.5095938
Published: June 2019
View articletitled, Thermal atomic layer etching of crystalline GaN using sequential exposures of XeF2 and BCl3
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Journal Articles

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

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Jeffrey M. Woodward, Samantha G. Rosenberg, Alexander C. Kozen, Neeraj Nepal, Scooter D. Johnson, Christa Wagenbach, Andrew H. Rowley, Zachary R. Robinson, Howie Joress, Karl F. Ludwig, Jr., Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030901 (2019)
https://doi.org/10.1116/1.5081919
Published: March 2019
View articletitled, Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering
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Journal Articles

In situ studies of low temperature atomic level processing of GaN surfaces for atomic layer epitaxial growth

Editor’s PickAvailable to Purchase
Samantha G. Rosenberg, Christa Wagenbach, Virginia R. Anderson, Scooter D. Johnson, Neeraj Nepal, Alexander C. Kozen, Jeffrey M. Woodward, Zachary R. Robinson, Max Munger, Howie Joress, Karl F. Ludwig, Jr., Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020928 (2019)
https://doi.org/10.1116/1.5080380
Published: February 2019
View articletitled, In situ studies of low temperature atomic level processing of GaN surfaces for atomic layer epitaxial growth
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Journal Articles

Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering

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Neeraj Nepal, Virginia R. Anderson, Scooter D. Johnson, Brian P. Downey, David J. Meyer, Zachary R. Robinson, Jeffrey M. Woodward, Karl F. Ludwig, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020910 (2019)
https://doi.org/10.1116/1.5063340
Published: January 2019
View articletitled, Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
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Journal Articles

Low temperature surface preparation of GaN substrates for atomic layer epitaxial growth: Assessment of ex situ preparations

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Samantha G. Rosenberg, Daniel J. Pennachio, Christa Wagenbach, Scooter D. Johnson, Neeraj Nepal, Alexander C. Kozen, Jeffrey M. Woodward, Zachary Robinson, Howie Joress, Karl F. Ludwig, Chris J. Palmstrøm, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020908 (2019)
https://doi.org/10.1116/1.5080090
Published: January 2019
View articletitled, Low temperature surface preparation of GaN substrates for atomic layer epitaxial growth: Assessment of ex situ preparations
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Journal Articles

Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

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David R. Boris, Virginia R. Anderson, Neeraj Nepal, Scooter D. Johnson, Zachary R. Robinson, Alexander C. Kozen, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051503 (2018)
https://doi.org/10.1116/1.5034247
Published: July 2018
View articletitled, Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
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Journal Articles

Electrical characterization of ALD HfO2 high-k dielectrics on ( 2 ¯ 01) β-Ga2O3

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David I. Shahin, Marko J. Tadjer, Virginia D. Wheeler, Andrew D. Koehler, Travis J. Anderson, Charles R. Eddy, Jr., Aris Christou
Journal: Applied Physics Letters
Appl. Phys. Lett. 112, 042107 (2018)
https://doi.org/10.1063/1.5006276
Published: January 2018
View articletitled, Electrical characterization of ALD HfO2 high-k dielectrics on ( 2 ¯ 01) β-Ga2O3
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Journal Articles

Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering

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Virginia R. Anderson, Neeraj Nepal, Scooter D. Johnson, Zachary R. Robinson, Anindya Nath, Alexander C. Kozen, Syed B. Qadri, Alexander DeMasi, Jennifer K. Hite, Karl F. Ludwig, Jr., Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031508 (2017)
https://doi.org/10.1116/1.4979007
Published: March 2017
View articletitled, Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
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Journal Articles

Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods

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Neeraj Nepal, Virginia R. Anderson, Scooter D. Johnson, Brian P. Downey, David J. Meyer, Alexander DeMasi, Zachary R. Robinson, Karl F. Ludwig, Charles R. Eddy, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031504 (2017)
https://doi.org/10.1116/1.4978026
Published: March 2017
View articletitled, Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
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Journal Articles

Growth and characterization of Al2O3 films on fluorine functionalized epitaxial graphene

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Zachary R. Robinson, Glenn G. Jernigan, Virginia D. Wheeler, Sandra C. Hernández, Charles R. Eddy, Jr., Tyler R. Mowll, Eng Wen Ong, Carl A. Ventrice, Jr., Heike Geisler, Ivo Pletikosic, Hongbo Yang, Tonica Valla
Journal: Journal of Applied Physics
J. Appl. Phys. 120, 075302 (2016)
https://doi.org/10.1063/1.4960803
Published: August 2016
View articletitled, Growth and characterization of Al2O3 films on fluorine functionalized epitaxial graphene
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Journal Articles

Effect of 5 MeV proton irradiation damage on performance of β-Ga2O3 photodetectors

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Shihyun Ahn, Yi-Hsuan Lin, Fan Ren, Sooyeoun Oh, Younghun Jung, Gwangseok Yang, Jihyun Kim, Michael A. Mastro, Jennifer K. Hite, Charles R. Eddy, Jr., Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041213 (2016)
https://doi.org/10.1116/1.4950872
Published: May 2016
View articletitled, Effect of 5 MeV proton irradiation damage on performance of β-Ga2O3 photodetectors
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Journal Articles

Elevated temperature performance of Si-implanted solar-blind β-Ga2O3 photodetectors

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Shihyun Ahn, Fan Ren, Sooyeoun Oh, Younghun Jung, Jihyun Kim, Michael A. Mastro, Jennifer K. Hite, Charles R. Eddy, Jr., S. J. Pearton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041207 (2016)
https://doi.org/10.1116/1.4948361
Published: April 2016
View articletitled, Elevated temperature performance of Si-implanted solar-blind β-Ga2O3 photodetectors
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