Page 1 | Search Results | AIP Publishing

Skip to Main Content

Skip Nav Destination

1-4 of 4

Sort by

Sort Order Select

Journal Articles

Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications

Negin Golshani, V. Mohammadi, H. Schellevis, C. I. M. Beenakker, R. Ishihara

APL Mater. 2, 100702 (2014)

https://doi.org/10.1063/1.4897959

Published: October 2014

View articletitled, Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications

Journal Articles

Single-grain Si thin-film transistors on flexible polyimide substrate fabricated from doctor-blade coated liquid-Si

J. Zhang, M. Trifunovic, M. van der Zwan, H. Takagishi, R. Kawajiri, T. Shimoda, C. I. M. Beenakker, R. Ishihara

Appl. Phys. Lett. 102, 243502 (2013)

https://doi.org/10.1063/1.4811356

Published: June 2013

View articletitled, Single-grain Si thin-film transistors on flexible polyimide substrate fabricated from doctor-blade coated liquid-Si

Includes: Supplementary data

Journal Articles

Formation of location-controlled crystalline islands using substrate-embedded seeds in excimer-laser crystallization of silicon films

Paul Ch. van der Wilt, B. D. van Dijk, G. J. Bertens, R. Ishihara, C. I. M. Beenakker

Appl. Phys. Lett. 79, 1819–1821 (2001)

https://doi.org/10.1063/1.1402641

Published: September 2001

View articletitled, Formation of location-controlled crystalline islands using substrate-embedded seeds in excimer-laser crystallization of silicon films

Journal Articles

Decomposition and product formation in CF₄‐O₂ plasma etching silicon in the afterglow

C. I. M. Beenakker, J. H. J. van Dommelen, R. P. J. van de Poll

J. Appl. Phys. 52, 480–485 (1981)

https://doi.org/10.1063/1.329812

Published: January 1981

View articletitled, Decomposition and product formation in CF4‐O2 plasma etching silicon in the afterglow