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Journal Articles

Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

F. Geenen, A. Constant, E. Solano, D. Deduytsche, C. Mocuta, P. Coppens, C. Detavernier

J. Appl. Phys. 127, 215701 (2020)

https://doi.org/10.1063/5.0006003

Published: June 2020

View article titled, Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

Journal Articles

The influence of alloying on the phase formation sequence of ultra-thin nickel silicide films and on the inheritance of texture

F. A. Geenen, E. Solano, J. Jordan-Sweet, C. Lavoie, C. Mocuta, C. Detavernier

J. Appl. Phys. 123, 185302 (2018)

https://doi.org/10.1063/1.5022070

Published: May 2018

View article titled, The influence of alloying on the phase formation sequence of ultra-thin nickel silicide films and on the inheritance of texture

Journal Articles

Controlling the formation and stability of ultra-thin nickel silicides - An alloying strategy for preventing agglomeration

F. A. Geenen, K. van Stiphout, A. Nanakoudis, S. Bals, A. Vantomme, J. Jordan-Sweet, C. Lavoie, C. Detavernier

J. Appl. Phys. 123, 075303 (2018)

https://doi.org/10.1063/1.5009641

Published: February 2018

View article titled, Controlling the formation and stability of ultra-thin nickel silicides - An alloying strategy for preventing agglomeration

Includes: Supplementary data

Journal Articles

Texture in thin film silicides and germanides: A review

B. De Schutter, K. De Keyser, C. Lavoie, C. Detavernier

Appl. Phys. Rev. 3, 031302 (2016)

https://doi.org/10.1063/1.4960122

Published: August 2016

View article titled, Texture in thin film silicides and germanides: A review

Journal Articles

Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)

B. De Schutter, K. Van Stiphout, N. M. Santos, E. Bladt, J. Jordan-Sweet, S. Bals, C. Lavoie, C. M. Comrie, A. Vantomme, C. Detavernier

J. Appl. Phys. 119, 135305 (2016)

https://doi.org/10.1063/1.4945317

Published: April 2016

View article titled, Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)

Includes: Supplementary data

Journal Articles

On the nucleation of PdSi and NiSi₂ during the ternary Ni(Pd)/Si(100) reaction

A. Schrauwen, J. Demeulemeester, A. Kumar, W. Vandervorst, C. M. Comrie, C. Detavernier, K. Temst, A. Vantomme

J. Appl. Phys. 114, 063518 (2013)

https://doi.org/10.1063/1.4818333

Published: August 2013

View article titled, On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction

Journal Articles

Effect of high temperature deposition on CoSi₂ phase formation

C. M. Comrie, H. Ahmed, D. Smeets, J. Demeulemeester, S. Turner, G. Van Tendeloo, C. Detavernier, A. Vantomme

J. Appl. Phys. 113, 234902 (2013)

https://doi.org/10.1063/1.4811352

Published: June 2013

View article titled, Effect of high temperature deposition on CoSi2 phase formation

Journal Articles

On the growth kinetics of Ni(Pt) silicide thin films

J. Demeulemeester, D. Smeets, C. M. Comrie, N. P. Barradas, A. Vieira, C. Van Bockstael, C. Detavernier, K. Temst, A. Vantomme

J. Appl. Phys. 113, 163504 (2013)

https://doi.org/10.1063/1.4802738

Published: April 2013

View article titled, On the growth kinetics of Ni(Pt) silicide thin films

Journal Articles

Band alignment in Ge/GeO_x/HfO₂/TiO₂ heterojunctions as measured by hard x-ray photoelectron spectroscopy

A. K. Rumaiz, J. C. Woicik, C. Weiland, Q. Xie, D. P. Siddons, G. H. Jaffari, C. Detavernier

Appl. Phys. Lett. 101, 222110 (2012)

https://doi.org/10.1063/1.4768947

Published: November 2012

View article titled, Band alignment in Ge/GeOx/HfO2/TiO2 heterojunctions as measured by hard x-ray photoelectron spectroscopy

Journal Articles

In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)

J. Demeulemeester, W. Knaepen, D. Smeets, A. Schrauwen, C. M. Comrie, N. P. Barradas, A. Vieira, C. Detavernier, K. Temst, A. Vantomme

J. Appl. Phys. 111, 043511 (2012)

https://doi.org/10.1063/1.3681331

Published: February 2012

View article titled, In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)

Journal Articles

Sn diffusion during Ni germanide growth on Ge_1–_xSn_x

J. Demeulemeester, A. Schrauwen, O. Nakatsuka, S. Zaima, M. Adachi, Y. Shimura, C. M. Comrie, C. Fleischmann, C. Detavernier, K. Temst, A. Vantomme

Appl. Phys. Lett. 99, 211905 (2011)

https://doi.org/10.1063/1.3662925

Published: November 2011

View article titled, Sn diffusion during Ni germanide growth on Ge1–xSnx

Journal Articles

Influence of the Cu-Te composition and microstructure on the resistive switching of Cu-Te/Al₂O₃/Si cells

L. Goux, K. Opsomer, R. Degraeve, R. Müller, C. Detavernier, D. J. Wouters, M. Jurczak, L. Altimime, J. A. Kittl

Appl. Phys. Lett. 99, 053502 (2011)

https://doi.org/10.1063/1.3621835

Published: August 2011

View article titled, Influence of the Cu-Te composition and microstructure on the resistive switching of Cu-Te/Al2O3/Si cells

Journal Articles

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO 2 on Si and Ge substrates

K. Devloo-Casier, J. Dendooven, K. F. Ludwig, G. Lekens, J. D’Haen, C. Detavernier

Appl. Phys. Lett. 98, 231905 (2011)

https://doi.org/10.1063/1.3598433

Published: June 2011

View article titled, In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO 2 on Si and Ge substrates

Journal Articles

The influence of Pt redistribution on Ni 1 − x Pt x Si growth properties

J. Demeulemeester, D. Smeets, C. M. Comrie, C. Van Bockstael, W. Knaepen, C. Detavernier, K. Temst, A. Vantomme

J. Appl. Phys. 108, 043505 (2010)

https://doi.org/10.1063/1.3455873

Published: August 2010

View article titled, The influence of Pt redistribution on Ni 1 − x Pt x Si growth properties

Journal Articles

Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

K. De Keyser, C. Van Bockstael, R. L. Van Meirhaeghe, C. Detavernier, E. Verleysen, H. Bender, W. Vandervorst, J. Jordan-Sweet, C. Lavoie

Appl. Phys. Lett. 96, 173503 (2010)

https://doi.org/10.1063/1.3384997

Published: April 2010

View article titled, Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

Journal Articles

In situ x-ray diffraction study of Ni–Yb interlayer and alloy systems on Si(100)

W. Knaepen, J. Demeulemeester, J. Jordan-Sweet, A. Vantomme, C. Detavernier, R. L. Van Meirhaeghe, C. Lavoie

J. Vac. Sci. Technol. A 28, 20–26 (2010)

https://doi.org/10.1116/1.3259875

Published: November 2009

View article titled, In situ x-ray diffraction study of Ni–Yb interlayer and alloy systems on Si(100)

Journal Articles

Composition influence on the physical and electrical properties of Sr x Ti 1 − x O y -based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

J. Appl. Phys. 106, 094101 (2009)

https://doi.org/10.1063/1.3246835

Published: November 2009

View article titled, Composition influence on the physical and electrical properties of Sr x Ti 1 − x O y -based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

Journal Articles

In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers

C. Van Bockstael, C. Detavernier, R. L. Van Meirhaeghe, J. L. Jordan-Sweet, C. Lavoie

J. Appl. Phys. 106, 064515 (2009)

https://doi.org/10.1063/1.3194318

Published: September 2009

View article titled, In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers

Journal Articles

Interdiffusion and crystallization in HfO 2 / Al 2 O 3 superlattices

C. Adelmann, J. Kesters, K. Opsomer, C. Detavernier, J. A. Kittl, S. Van Elshocht

Appl. Phys. Lett. 95, 091911 (2009)

https://doi.org/10.1063/1.3223616

Published: September 2009

View article titled, Interdiffusion and crystallization in HfO 2 / Al 2 O 3 superlattices

Journal Articles

In situ x-ray diffraction study of metal induced crystallization of amorphous germanium

W. Knaepen, S. Gaudet, C. Detavernier, R. L. Van Meirhaeghe, J. Jordan Sweet, C. Lavoie

J. Appl. Phys. 105, 083532 (2009)

https://doi.org/10.1063/1.3110722

Published: April 2009

View article titled, In situ x-ray diffraction study of metal induced crystallization of amorphous germanium

NARROW

Topics

Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

The influence of alloying on the phase formation sequence of ultra-thin nickel silicide films and on the inheritance of texture

Controlling the formation and stability of ultra-thin nickel silicides - An alloying strategy for preventing agglomeration

Texture in thin film silicides and germanides: A review

Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)

On the nucleation of PdSi and NiSi₂ during the ternary Ni(Pd)/Si(100) reaction

Effect of high temperature deposition on CoSi₂ phase formation

On the growth kinetics of Ni(Pt) silicide thin films

Band alignment in Ge/GeO_x/HfO₂/TiO₂ heterojunctions as measured by hard x-ray photoelectron spectroscopy

In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)

Sn diffusion during Ni germanide growth on Ge_1–_xSn_x

Influence of the Cu-Te composition and microstructure on the resistive switching of Cu-Te/Al₂O₃/Si cells

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: Initial growth of HfO 2 on Si and Ge substrates

The influence of Pt redistribution on Ni 1 − x Pt x Si growth properties

Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

In situ x-ray diffraction study of Ni–Yb interlayer and alloy systems on Si(100)

Composition influence on the physical and electrical properties of Sr x Ti 1 − x O y -based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

In situ study of the formation of silicide phases in amorphous Ni–Si mixed layers

Interdiffusion and crystallization in HfO 2 / Al 2 O 3 superlattices

In situ x-ray diffraction study of metal induced crystallization of amorphous germanium

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