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Journal Articles

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

F. Weilnboeck, R. L. Bruce, S. Engelmann, G. S. Oehrlein, D. Nest, T.-Y. Chung, D. Graves, M. Li, D. Wang, C. Andes, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 993–1004 (2010)
https://doi.org/10.1116/1.3484249
Published: September 2010
View article titled, Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry
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Journal Articles

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges

S. Engelmann, R. L. Bruce, F. Weilnboeck, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1165–1179 (2009)
https://doi.org/10.1116/1.3137012
Published: May 2009
View article titled, Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C 4 F 8 - and C F 4 -based discharges
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Journal Articles

Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies

S. Engelmann, R. L. Bruce, M. Sumiya, T. Kwon, R. Phaneuf, G. S. Oehrlein, C. Andes, D. Graves, D. Nest, E. A. Hudson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 92–106 (2009)
https://doi.org/10.1116/1.3054342
Published: January 2009
View article titled, Plasma-surface interactions of advanced photoresists with C 4 F 8 ∕ Ar discharges: Plasma parameter dependencies
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Journal Articles

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

D. Nest, D. B. Graves, S. Engelmann, R. L. Bruce, F. Weilnboeck, G. S. Oehrlein, C. Andes, E. A. Hudson
Journal: Applied Physics Letters
Appl. Phys. Lett. 92, 153113 (2008)
https://doi.org/10.1063/1.2912028
Published: April 2008
View article titled, Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation
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Journal Articles

Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams

S. Engelmann, R. L. Bruce, T. Kwon, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, C. Andes, D. Graves, D. Nest, E. A. Hudson, P. Lazzeri, E. Iacob, M. Anderle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1353–1364 (2007)
https://doi.org/10.1116/1.2759935
Published: July 2007
View article titled, Plasma-surface interactions of model polymers for advanced photoresists using C 4 F 8 ∕ Ar discharges and energetic ion beams
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