Skip Nav Destination
Update search
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
NARROW
Format
Topics
Journal
Article Type
Issue Section
Date
Availability
1-20 of 38
C. A. Londos
Close
Journal Articles
Journal:
AIP Advances
AIP Advances 12, 025112 (2022)
Published: February 2022
Includes: Supplementary data
Journal Articles
Experimental and theoretical study of the C4 defect in neutron irradiated silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 123, 145702 (2018)
Published: April 2018
Journal Articles
Infrared studies of the evolution of the CiOi(SiI) defect in irradiated Si upon isothermal anneals
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 119, 125704 (2016)
Published: March 2016
Journal Articles
An atomistic vision of the Mass Action Law: Prediction of carbon/oxygen defects in silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 118, 125706 (2015)
Published: September 2015
Journal Articles
Oxygen aggregation kinetics, thermal donors and carbon-oxygen defect formation in silicon containing carbon and tin
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 118, 015704 (2015)
Published: July 2015
Journal Articles
Oxygen defect processes in silicon and silicon germanium
Available to Purchase
Journal:
Applied Physics Reviews
Appl. Phys. Rev. 2, 021306 (2015)
Published: June 2015
Journal Articles
Vacancy-oxygen defects in p-type Si1−xGex
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 116, 133502 (2014)
Published: October 2014
Journal Articles
G-centers in irradiated silicon revisited: A screened hybrid density functional theory approach
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 115, 183509 (2014)
Published: May 2014
Journal Articles
Di-interstitial defect in silicon revisited
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 114, 193513 (2013)
Published: November 2013
Journal Articles
Impact of isovalent doping on radiation defects in silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 114, 113504 (2013)
Published: September 2013
Journal Articles
A-centers in silicon studied with hybrid density functional theory
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 103, 052101 (2013)
Published: July 2013
Journal Articles
Localised vibrational mode spectroscopy studies of self-interstitial clusters in neutron irradiated silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 114, 043502 (2013)
Published: July 2013
Journal Articles
Journal Articles
Impact of isovalent doping on the trapping of vacancy and interstitial related defects in Si
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 113, 113506 (2013)
Published: March 2013
Journal Articles
Production and evolution of A-centers in n-type Si1−xGex
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 113, 113507 (2013)
Published: March 2013
Journal Articles
Defect engineering of the oxygen-vacancy clusters formation in electron irradiated silicon by isovalent doping: An infrared perspective
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 112, 123517 (2012)
Published: December 2012
Journal Articles
Interaction of n-type dopants with oxygen in silicon and germanium
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 112, 073706 (2012)
Published: October 2012
Journal Articles
Formation and evolution of oxygen-vacancy clusters in lead and tin doped silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 111, 123508 (2012)
Published: June 2012
Journal Articles
The annealing mechanism of the radiation-induced vacancy-oxygen defect in silicon
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 111, 113530 (2012)
Published: June 2012
Journal Articles
Point defect engineering strategies to suppress A-center formation in silicon
Available to Purchase
Journal:
Applied Physics Letters
Appl. Phys. Lett. 99, 241901 (2011)
Published: December 2011
Includes: Supplementary data
1