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Journal Articles

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al₂O₃/TiO₂ nanolaminates grown with different precursor purge times

Partha Sarathi Padhi, R. S. Ajimsha, S. K. Rai, Sushmita Bhartiya, Aniruddha Bose, Bidyadhar Das, Manoj Kumar Tiwari, Pankaj Misra

J. Vac. Sci. Technol. A 41, 063201 (2023)

https://doi.org/10.1116/6.0002849

Published: September 2023

View article titled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times

Includes: Supplementary data

Journal Articles

Effect of oxygen ion beam bombardment on depth resolved hydrogen distribution in stoichiometric alumina thin films, deposited by e-beam evaporation

Arijeet Das, Chandrachur Mukherjee, Rajiv Kamparath, Aniruddha Bose, Shreyashkar D. Singh, Deodatta M. Phase, Sanjay K. Rai, Satish C. Joshi, Tapas Ganguli

J. Vac. Sci. Technol. B 33, 052002 (2015)

https://doi.org/10.1116/1.4929418

Published: August 2015

View article titled, Effect of oxygen ion beam bombardment on depth resolved hydrogen distribution in stoichiometric alumina thin films, deposited by e-beam evaporation

Journal Articles

Hydrogen removal from e-beam deposited alumina thin films by oxygen ion beam

Arijeet Das, C. Mukharjee, K. Rajiv, Aniruddha Bose, S. D. Singh, D. M. Phase, S. K. Rai, Tapas Ganguli, S. C. Joshi, S. K. Deb

AIP Conf. Proc. 1591, 919–921 (2014)

https://doi.org/10.1063/1.4872802

Published: April 2014

View article titled, Hydrogen removal from e-beam deposited alumina thin films by oxygen ion beam