Page 1 | Search Results | Review of Scientific Instruments

1-13 of 13

Sort by

Sort Order Select

Journal Articles

Tile-and-trim micro-resonator array fabrication optimized for high multiplexing factors

Christopher M. McKenney, Jason E. Austermann, James A. Beall, Bradley J. Dober, Shannon M. Duff, Jiansong Gao, Gene C. Hilton, Johannes Hubmayr, Dale Li, Joel N. Ullom, Jeff L. Van Lanen, Michael R. Vissers

Rev. Sci. Instrum. 90, 023908 (2019)

https://doi.org/10.1063/1.5037301

Published: February 2019

View article titled, Tile-and-trim micro-resonator array fabrication optimized for high multiplexing factors

Journal Articles

Pulse stretcher with two beamsplitting elements for excimer laser pulses

Qiang Wang, Yanling Han, Cunding Liu, Bincheng Li

Rev. Sci. Instrum. 88, 123113 (2017)

https://doi.org/10.1063/1.5005123

Published: December 2017

View article titled, Pulse stretcher with two beamsplitting elements for excimer laser pulses

Journal Articles

A micromachined piezoelectric microgripper for manipulation of micro/nanomaterials

Huaduo Shi, Weiliang Shi, Ran Zhang, Junyi Zhai, Jinkui Chu, Shuxiang Dong

Rev. Sci. Instrum. 88, 065002 (2017)

https://doi.org/10.1063/1.4985110

Published: June 2017

View article titled, A micromachined piezoelectric microgripper for manipulation of micro/nanomaterials

Journal Articles

High-throughput atomic force microscopes operating in parallel

Hamed Sadeghian, Rodolf Herfst, Bert Dekker, Jasper Winters, Tom Bijnagte, Ramon Rijnbeek

Rev. Sci. Instrum. 88, 033703 (2017)

https://doi.org/10.1063/1.4978285

Published: March 2017

View article titled, High-throughput atomic force microscopes operating in parallel

Journal Articles

A new flexible scatterometer for critical dimension metrology

Matthias Wurm, Frank Pilarski, Bernd Bodermann

Rev. Sci. Instrum. 81, 023701 (2010)

https://doi.org/10.1063/1.3280160

Published: February 2010

View article titled, A new flexible scatterometer for critical dimension metrology

Journal Articles

Solid state microcavity dye lasers fabricated by nanoimprint lithography

D. Nilsson, T. Nielsen, A. Kristensen

Rev. Sci. Instrum. 75, 4481–4486 (2004)

https://doi.org/10.1063/1.1794411

Published: October 2004

View article titled, Solid state microcavity dye lasers fabricated by nanoimprint lithography

Journal Articles

Ultraviolet phase-modulated ellipsometer

Enric Garcia-Caurel, Jean Luc Moncel, Francis Bos, Bernard Drévillon

Rev. Sci. Instrum. 73, 4307–4312 (2002)

https://doi.org/10.1063/1.1518788

Published: November 2002

View article titled, Ultraviolet phase-modulated ellipsometer

Journal Articles

Optimization of multilayer reflectivity and bandpass for soft to hard x‐ray applications [0.1–200 keV]

K. Vestli, E. Ziegler

Rev. Sci. Instrum. 67, 3356 (1996)

https://doi.org/10.1063/1.1147462

Published: September 1996

View article titled, Optimization of multilayer reflectivity and bandpass for soft to hard x‐ray applications [0.1–200 keV]

Journal Articles

Tracking and dynamic control of the angular alignment position in a photolithographic mask aligner by the moiré interference technique

Brahm Pal Singh, Toshio Goto, Rina Sharma, A. K. Kanjilal, Ram Narain, V. T. Chitnis, J. Liu, Yoshiyuki Uchida

Rev. Sci. Instrum. 66, 2658–2660 (1995)

https://doi.org/10.1063/1.1145605

Published: March 1995

View article titled, Tracking and dynamic control of the angular alignment position in a photolithographic mask aligner by the moiré interference technique

Journal Articles

H⁻ beam based projection microlithography: A conceptual study of the beam parameters^a)

S. K. Guharay, M. Reiser, V. G. Dudnikov

Rev. Sci. Instrum. 65, 1745–1748 (1994)

https://doi.org/10.1063/1.1144870

Published: May 1994

View article titled, H− beam based projection microlithography: A conceptual study of the beam parametersa)

Journal Articles

H⁻ beam based projection microlithography: A conceptual study of the beam parameters (abstract)^a)

S. K. Guharay, M. Reiser, V. G. Dudnikov

Rev. Sci. Instrum. 65, 1310 (1994)

https://doi.org/10.1063/1.1144989

Published: April 1994

View article titled, H− beam based projection microlithography: A conceptual study of the beam parameters (abstract)a)

Journal Articles

Improved bolometry system for reversed field pinch research

G. Miller, J. C. Ingraham, L. S. Schrank

Rev. Sci. Instrum. 59, 700–708 (1988)

https://doi.org/10.1063/1.1139813

Published: May 1988

View article titled, Improved bolometry system for reversed field pinch research

Journal Articles

Microminiature refrigeration

W. A. Little

Rev. Sci. Instrum. 55, 661–680 (1984)

https://doi.org/10.1063/1.1137820

Published: May 1984

View article titled, Microminiature refrigeration

NARROW

Topics

Tile-and-trim micro-resonator array fabrication optimized for high multiplexing factors

Pulse stretcher with two beamsplitting elements for excimer laser pulses

A micromachined piezoelectric microgripper for manipulation of micro/nanomaterials

High-throughput atomic force microscopes operating in parallel

A new flexible scatterometer for critical dimension metrology

Solid state microcavity dye lasers fabricated by nanoimprint lithography

Ultraviolet phase-modulated ellipsometer

Optimization of multilayer reflectivity and bandpass for soft to hard x‐ray applications [0.1–200 keV]

Tracking and dynamic control of the angular alignment position in a photolithographic mask aligner by the moiré interference technique

H⁻ beam based projection microlithography: A conceptual study of the beam parameters^a)

H⁻ beam based projection microlithography: A conceptual study of the beam parameters (abstract)^a)

Improved bolometry system for reversed field pinch research

Microminiature refrigeration

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only