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X-ray lithography
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Journal Articles

LIGA for lobster: First observation of lobster-eye focusing from lithographically produced optics

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Andrew G. Peele, Thomas H. K. Irving, Keith A. Nugent, Derrick C. Mancini, Todd R. Christenson, Rob Petre, Steven P. Brumby, William C. Priedhorsky
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 72, 1843–1849 (2001)
https://doi.org/10.1063/1.1347377
Published: March 2001
View articletitled, LIGA for lobster: First observation of lobster-eye focusing from lithographically produced optics
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Journal Articles

Design of a beamline for soft and deep lithography on third generation synchrotron radiation source

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E. Di Fabrizio, A. Nucara, M. Gentili, R. Cingolani
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 70, 1605–1613 (1999)
https://doi.org/10.1063/1.1149640
Published: March 1999
View articletitled, Design of a beamline for soft and deep lithography on third generation synchrotron radiation source
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Journal Articles

Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers

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Y. Cheng, N.-Y. Kuo, C. H. Su
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 68, 2163–2166 (1997)
https://doi.org/10.1063/1.1148067
Published: May 1997
View articletitled, Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers
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Journal Articles

A new scanning photoemission microscope for ELETTRA: SuperMAXIMUM

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John T. Welnak, H. Solak, J. Wallace, F. Cerrina, F. Barbo, M. Bertolo, A. Bianco, S. Di Fonzo, S. Fontana, W. Jark, F. Mazzolini, R. Rosei, A. Savoia, J.H. Underwood, G. Margaritondo
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 67, 3358 (1996)
https://doi.org/10.1063/1.1147500
Published: September 1996
View articletitled, A new scanning photoemission microscope for ELETTRA: SuperMAXIMUM
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Journal Articles

Installation and initial operation of the Suss Advanced Lithography Model 4 X‐ray Stepper (abstract)

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Gregory M. Wells, J. P. Wallace, E. L. Brodsky, Q. J. Leonard, M. T. Reilly, P. D. Anderson, W. K. Lee, F. Cerrina, Klaus Simon
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 67, 3358 (1996)
https://doi.org/10.1063/1.1147382
Published: September 1996
View articletitled, Installation and initial operation of the Suss Advanced Lithography Model 4 X‐ray Stepper (abstract)
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Journal Articles

Beryllium window and acoustic delay line design for x‐ray lithography beam lines at the University of Wisconsin Center for X‐ray Lithography

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E. L. Brodsky, W. Hamilton, G. Wells, F. Cerrina, M. Corradini
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 63, 749–752 (1992)
https://doi.org/10.1063/1.1142651
Published: January 1992
View articletitled, Beryllium window and acoustic delay line design for x‐ray lithography beam lines at the University of Wisconsin Center for X‐ray Lithography
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Journal Articles

Superconducting storage ring NIJI‐III

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K. Emura, Y. Tsutsui, F. Miura, H. Takada, T. Tomimasu
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 63, 753–756 (1992)
https://doi.org/10.1063/1.1142652
Published: January 1992
View articletitled, Superconducting storage ring NIJI‐III
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Journal Articles

Development of compact synchrotron light source LUNA for x‐ray lithography

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M. Takahashi, S. Mandai, Y. Hoshi, Y. Kohno
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 63, 767–769 (1992)
https://doi.org/10.1063/1.1142657
Published: January 1992
View articletitled, Development of compact synchrotron light source LUNA for x‐ray lithography
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Journal Articles

X‐ray lithography at the VEPP‐3 storage ring

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L. D. Artamonova, A. N. Gentselev, G. A. Deis, A. A. Krasnoperova, E. V. Mikhalyov, V. S. Prokopenko, G. N. Kulipanov, L. A. Mezentseva, V. F. Pindyurin
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 63, 764–766 (1992)
https://doi.org/10.1063/1.1142656
Published: January 1992
View articletitled, X‐ray lithography at the VEPP‐3 storage ring
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Journal Articles

Present status of the SORTEC SR Facility

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N. Atoda, N. Awaji, M. Kodaira, T. Kishimoto, J. Nishino, K. Koga, Y. Maejima, I. Higashigawa, K. Yanagida
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 63, 1611–1612 (1992)
https://doi.org/10.1063/1.1142992
Published: January 1992
View articletitled, Present status of the SORTEC SR Facility
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Journal Articles

Computer control system of the superconducting SR‐light source ‘‘Aurora’’

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Hironari Yamada, S. H. I. Accelerator Research Group
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 1763–1766 (1989)
https://doi.org/10.1063/1.1141088
Published: July 1989
View articletitled, Computer control system of the superconducting SR‐light source ‘‘Aurora’’
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Journal Articles

NTT superconducting storage ring—Super‐ALIS

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T. Hosokawa, T. Kitayama, T. Hayasaka, S. Ido, Y. Uno, A. Shibayama, J. Nakata, K. Nishimura, M. Nakajima
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 1783–1785 (1989)
https://doi.org/10.1063/1.1140903
Published: July 1989
View articletitled, NTT superconducting storage ring—Super‐ALIS
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Journal Articles

The Adone wiggler x‐ray lithography beamline

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E. Burattini, A. Grilli, A. Balerna, E. Bernieri, S. Simeoni, C. Mencuccini, Chen Qian‐Hong
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 2133–2136 (1989)
https://doi.org/10.1063/1.1140801
Published: July 1989
View articletitled, The Adone wiggler x‐ray lithography beamline
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Journal Articles

150‐MeV racetrack microtron—injector of AURORA (abstract)

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M. Sugitani, SHI Accelerator Research Group
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 1794 (1989)
https://doi.org/10.1063/1.1141090
Published: July 1989
View articletitled, 150‐MeV racetrack microtron—injector of AURORA (abstract)
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Journal Articles

Parameters of exposure equipment for SOR x‐ray lithography (abstract)

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H. Oertel
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 2167 (1989)
https://doi.org/10.1063/1.1140810
Published: July 1989
View articletitled, Parameters of exposure equipment for SOR x‐ray lithography (abstract)
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Journal Articles

Synchrotron radiation lithography system in an atmospheric environment (invited)

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K. Okada, E. Kouno, E. Nomura, K. Suzuki, K. Fujii, Y. Tanaka, J. Iwata, Y. Kawase
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 1643–1648 (1989)
https://doi.org/10.1063/1.1141050
Published: July 1989
View articletitled, Synchrotron radiation lithography system in an atmospheric environment (invited)
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Journal Articles

Fine‐alignment exposure system for synchrotron x‐ray lithography (invited)

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Junji Itoh, Toshihiko Kanayama, Nobufumi Atoda, Koichiro Hoh
Journal: Review of Scientific Instruments
Rev. Sci. Instrum. 60, 1638–1642 (1989)
https://doi.org/10.1063/1.1141049
Published: July 1989
View articletitled, Fine‐alignment exposure system for synchrotron x‐ray lithography (invited)
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