From emerging science and novel technologies to the more traditional research and techniques, the 49th International Symposium of the AVS Science and Technology Society will offer the 3000-plus expected attendees an opportunity to learn more about a broad range of vacuum-related topics.
The Colorado Convention Center in Denver plays host to the conference from Sunday, 3 November, through Friday, 8 November. The weeklong technical program will feature sessions organized by the groups and divisions of AVS: advanced surface engineering, applied surface analysis, biomaterials interfaces, electrochemistry and fluid–solid interfaces, electronic materials and processing, magnetic interfaces and nanostructures, manufacturing science and technology, microelectromechanical systems, nanometer-scale science and technology, organic films and devices, plasma science and technology, processing at the nanoscale, surface sciences, thin films, and vacuum technology. More than 1300 papers will be presented in 103 technical sessions and 2 poster sessions.
Special topical conferences at this year’s meeting will include a...
