Glow Discharge Processes: Sputtering and Plasma Etching

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July 01 1981

B. Chapman;

B. Chapman

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J. L. Vossen

Reviewer

RCA Laboratories

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B. Chapman

,

J. L. Vossen

RCA Laboratories

Physics Today 34 (7), 62 (1981);

https://doi.org/10.1063/1.2914660

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Glow Discharge Processes: Sputtering and Plasma Etching Available to Purchase