The need for a vacuum environment has been encountered by more and more fields over the years. In high‐energy accelerators, extraneous molecules would attenuate the beam of particles being accelerated. In mass spectrometers, atmospheric gases would mask the sample being analyzed. In thin‐film production, impurities would affect the electrical properties of the film being deposited. Similar considerations arise in the fields of space simulation, surface physics, thermonuclear research, pollution detection and control, analytical instrumentation and many others.

1.
W. J.
Lange
,
J. Vac. Sci. and Technol.
7
,
228
(
1970
).
2.
K.
Kawasaki
,
T.
Sugita
,
I.
Kohno
,
J.
Watanabe
,
N.
Hayashi
,
J. Appl. Phys.
35
,
479
(
1964
).
3.
R. L. Jepsen, Proceedings of the Fourth International Vacuum Congress, 1968, page 317.
4.
W. M. Brubaker, Trans. 6th Amer. Vac. Soc. Symp., Pergamon, London (1960), page 302.
5.
T.
Tom
,
B. D.
James
,
J. Vac. Sci. and Technol.
6
,
304
(
1969
).
6.
T.
Tom
,
J. Vac. Sci. and Technol.
9
,
383
, (
1972
).
7.
R. A.
Douglas
,
J.
Zabritski
,
R. G.
Herb
,
Rev. Sci. Instr.
36
,
1
(
1965
).
8.
D. R. Denison, D. G. Bills, Abstracts of the 13th Amer. Vac. Soc. Symp., Herbick and Held, Pittsburgh (1966), page 15.
9.
K. A. Warren, D. R. Denison, D. G. Bills, Abstracts of the 13th Amer. Vac. Soc. Symp., Herbick and Held, Pittsburgh (1966), page 17.
10.
C. F. Brothers, T. Tom, D. F. Munro, Trans. 10th Amer. Vac. Soc. Symp. Macmillan, New York (1963), page 202.
11.
D. J.
Harra
,
T. W.
Snouse
,
J. Vac. Sci. and Technol.
9
,
552
(
1972
).
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