The purpose of this work is to investigate mechanism of anisotropic residual stress generation in laser peening. Residual stress induced by multiple pulse irradiation is simulated using stress distribution of single pulse. Contribution of each irradiation spot to the stress field is assumed to be additive, and the Mises yield condition is considered as constraint for the field addition process. The result explains well the anisotropic stress generation. The model can be applied to optimize the residual stress field.
Mechanism of anisotropic stress generation in laser peening process
Koji Hirano, Atsushi Sugihashi, Hirofumi Imai, Naoya Hamada; March 23–25, 2010. "Mechanism of anisotropic stress generation in laser peening process." Proceedings of the Pacific International Conference on Applications of Lasers and Optics. ICALEO® 2006: 25th International Congress on Laser Materials Processing and Laser Microfabrication. Wuhan, People’s Republic of China. (pp. P511). ASME. https://doi.org/10.2351/1.5060925
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