Recent market developments in electronic and opto-electronic devices based on small organic molecules and polymers is driving the search for a variety of new processing tools for thin-film deposition. In this paper, we describe a new vacuum-phase thin-film deposition technique — resonant infrared pulsed laser deposition — that is a true vapor phase deposition technique for thermally labile or photochemically sensitive organics and polymers. Several examples of thin-film deposition, including structural, insulating and conducting polymers, are presented. Specifications for a commercial thin-film deposition based on this technique are also discussed.
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