Titanium nitride (TiN) films are grown on Ti-6Al-4V substrates with a cw CO2 laser and precursor gas mixtures of TiCl4, H2, and N2. In situ diagnostic techniques are applied to study the kinetics of this laser chemical vapor deposition (LCVD) process. Pulsed dye laser induced fluorescence (LIF) spectroscopy is employed to obtain gas phase species concentrations at different instances relative to the processing laser. Multi-wavelength pyrometry is applied simultaneously to measure the substrate surface temperature. Post-processing materials analyses, namely, Stylus Profilometry and Auger Electron Spectroscopy yield growth rates and film compositions that are linked to the diagnostic results. Experiments are carried out for different laser powers and reactant gas pressures. Thus an empirical relationship between the growth rate and reactant partial pressures, the rate-controlling steps, and activation energy are determined.
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ICALEO '94: Proceedings of the Laser Materials Processing Conference
October 17–20, 1994
Orlando, Florida, USA
ISBN:
978-0-912035-52-9
PROCEEDINGS PAPER
Process diagnostics of laser chemical vapor deposition of titanium nitride Available to Purchase
Xiangli Chen;
Xiangli Chen
1
GE Corporate Research and Development Center
, Schenectady, NY 12301, USA
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Magdi Azer;
Magdi Azer
2
Quantum Laser Coporation
, Norcross, GA 30071, USA
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Keith Egland;
Keith Egland
3
Center for Laser Aided Materials Processing, Department of Mechanical and Industrial Engineering, University of Illinois at Urbana-Champaign
, Urbana, IL 61801, USA
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Jyoti Mazumder
Jyoti Mazumder
3
Center for Laser Aided Materials Processing, Department of Mechanical and Industrial Engineering, University of Illinois at Urbana-Champaign
, Urbana, IL 61801, USA
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Published Online:
October 01 1994
Citation
Xiangli Chen, Magdi Azer, Keith Egland, Jyoti Mazumder; October 17–20, 1994. "Process diagnostics of laser chemical vapor deposition of titanium nitride." Proceedings of the ICALEO '94: Proceedings of the Laser Materials Processing Conference. ICALEO '94: Proceedings of the Laser Materials Processing Conference. Orlando, Florida, USA. (pp. pp. 275-284). ASME. https://doi.org/10.2351/1.5058798
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