The low pressure pyrolysis of alkylmetals on conducting, semiconducting and non-conducting surfaces is studied using multiphoton and electron ionization analysis. No products of surface radical recombination (such as CH4 and C2H6) can be seen under any conditions employed. The activation energy for gas phase methyl radical production is found to be 30 kcal/mol for trimethylgallium, which is to be compared with 13 ± 2 kcal/mol observed for trimethylaluminum decomposition. A deposition mechanism is proposed to account for these observations.
REFERENCES
1.
G.B.
Stringfellow
(1984
). J. Crystal Growth
68
: 111
–122
.2.
P.D.
Dapkus
(1982
). Annu. Rev. Mater. Sci.
8
:243
–269
.3.
G.B.
Stringfellow
(1978
). Annu. Rev. Mater. Sci.
8
:73
–98
.4.
T.G.
DiGiuseppe
, J.W.
Hudgens
, and M.C.
Lin
(1981
). Chem. Phys. Lett.
82
:267
–269
.5.
6.
J.W.
Hudgens
, T.G.
DiGiuseppe
, and M.C.
Lin
(1983
). J. Chem. Phys.
79
:571
–582
.7.
D.W.
Squire
, C.S.
Dulcey
, and M.C.
Lin
(1985
). Chem. Phys. Lett.
116
:525
–528
.8.
D.W.
Squire
, C.S.
Dulcey
, and M.C.
Lin
(1985
). J. Vac. Sci. Technol. B
3
:1513
–1519
.
This content is only available via PDF.
© 1986 Laser Institute of America.
1986
Laser Institute of America
You do not currently have access to this content.