Automatic sub-micron mask and reticle inspection

Mathews, John

doi:10.2351/1.5057320

PROCEEDINGS PAPER

Automatic sub-micron mask and reticle inspection

John Mathews

KLA Instruments Corporation

, 2051 Mission College Blvd., Santa Clara, California 95054,

USA

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https://doi.org/10.2351/1.5057320

Published Online: September 01 1982

This paper describes an automatic photomask and reticle inspection system that will detect submicron defects by comparison of optically imaged patterns directly to the database or to similar patterns on the same photoplate.

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1982

Laser Institute of America

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Automatic sub-micron mask and reticle inspection