A laser scanning microscope has been developed for inprocess inspection of semiconductor wafers. The system is capable of discriminating surface particulates from the pattern image, producing real-time images of the contaminants.

1.
D. P.
Jablonowski
, “
Laser Scanning and Multiple Detection for Video Image Processing
”, U.S. Patent 4,286,293, issued August 25,
1981
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© 1982 Laser Institute of America.
1982
Laser Institute of America
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