Due to technical development of the adaptive optics, use of them in various laser processing applications has become possible. These techniques based on the adaptive optics have been applied with various lasers to generate diffraction patterns with equal intensity spots. In this paper ultrashort laser pulse ablation with intensity modulated diffraction pattern is presented. Diffraction patterns are generated with the Computer Generated Holograms (CGH) created using the Spatial Light Modulator (SLM). Applied CGHs are designed using method based on the Iterative Fourier Transform Algorithm (IFTA). Added to this Fresnel lenses are used to avoid problems with 0th-diffraction order. With this kind of designing procedure it is possible to generate diffraction patterns with intensity variation between diffracted spots. By intensity modulating the diffracted beams it is possible to ablate virtually arbitrary patterns with depth variation into the different materials. In this paper different kinds of CGHs are designed to generate various diffraction patterns with intensity modulation. These patterns are used to ablate greyscale images directly into the silicon using ultrashort pulses.
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ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
October 6–10, 2013
Miami, Florida, USA
ISBN:
978-0-912035-98-7
PROCEEDINGS PAPER
Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator Available to Purchase
Jarno J. J. Kaakkunen;
Jarno J. J. Kaakkunen
1
VTT Technical Research Center of Finland
Tuotantokatu 2, Lappeenranta, FI-53850, Finland
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Martti Silvennoinen;
Martti Silvennoinen
2
Institute of Photonics, University of Eastern Finland
, Joensuu Campus, Yliopistonkatu 7, FI-80101, Joensuu, Finland
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Kimmo Päiväsaari;
Kimmo Päiväsaari
2
Institute of Photonics, University of Eastern Finland
, Joensuu Campus, Yliopistonkatu 7, FI-80101, Joensuu, Finland
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Petri Laakso;
Petri Laakso
1
VTT Technical Research Center of Finland
Tuotantokatu 2, Lappeenranta, FI-53850, Finland
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Pasi Vahimaa
Pasi Vahimaa
2
Institute of Photonics, University of Eastern Finland
, Joensuu Campus, Yliopistonkatu 7, FI-80101, Joensuu, Finland
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Published Online:
October 01 2013
Citation
Jarno J. J. Kaakkunen, Martti Silvennoinen, Kimmo Päiväsaari, Petri Laakso, Pasi Vahimaa; October 6–10, 2013. "Parallel femtosecond laser processing using intensity modulated diffraction pattern produced with spatial light modulator." Proceedings of the ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Miami, Florida, USA. (pp. pp. 672-676). ASME. https://doi.org/10.2351/1.5062948
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