Monitoring both near and far field laser beam parameters is extremely helpful in understanding the quality of a laser process. The measurement of such parameters has not been practical to date due to the required disruption of the process beam in order to make the measurement. A significant quality control enhancement could be realized if one could monitor both near and far field patterns of the laser system during the process if it could be done with minimal loss or alteration of the process beam. A novel optical design is discussed that integrated into a laser process head with minimal power loss and disruption to the Laser beam. This in-line monitoring system provides focal spot size, Rayleigh length, focal position and M- squared values as well as all the other ISO beam profiling parameters in real time. An in-line laser beam monitoring system makes possible a higher level of quality control and reduced scrap thereby providing a higher level of reliability to laser processing.
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ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
October 6–10, 2013
Miami, Florida, USA
ISBN:
978-0-912035-98-7
PROCEEDINGS PAPER
Non-disruptive, low loss in-line laser beam monitoring system for industrial laser processing Available to Purchase
Michael Scaggs;
Michael Scaggs
Haas Laser Technologies, Inc.
37 Ironia Road, Flanders, NJ 07836, USA
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Gil Haas
Gil Haas
Haas Laser Technologies, Inc.
37 Ironia Road, Flanders, NJ 07836, USA
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Published Online:
October 01 2013
Citation
Michael Scaggs, Gil Haas; October 6–10, 2013. "Non-disruptive, low loss in-line laser beam monitoring system for industrial laser processing." Proceedings of the ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2013: 32nd International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Miami, Florida, USA. (pp. pp. 211-218). ASME. https://doi.org/10.2351/1.5062877
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