Ultra short laser pulses in the ps or fs regime are used, when high requirements concerning machining quality are demanded. However, beside the quality also the process efficiency denotes a key factor for the successful transfer of this technology into real industrial applications and the process efficiency is mainly influenced by the removal rate. In this work the results of a study about the influence of the pulse duration onto the removal rate for pulses from 10 ps down to 250 fs will be presented. The investigated materials were copper, stainless steel, silicon, germanium, zirconium oxide (ZrO2), polycrystalline diamond (PCD) fused silica and soda lime glass. An increase of the removal rate with shorter pulse durations was observed for all materials except the two glasses. A very special behaviour with a sharp change between two regimes with different ablation processes was observed for soda lime glasses for both wavelengths.
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ICALEO 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
September 23–27, 2012
Anaheim, California, USA
ISBN:
978-0-912035-96-3
PROCEEDINGS PAPER
From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides Available to Purchase
Beat Neuenschwander;
Beat Neuenschwander
Bern University of Applied Science, Institute of Applied Laser, Photonics and Surface Technologies
, Pestalozzistrasse 20, 3400 Burgdorf, Switzerland
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Beat Jaeggi;
Beat Jaeggi
Bern University of Applied Science, Institute of Applied Laser, Photonics and Surface Technologies
, Pestalozzistrasse 20, 3400 Burgdorf, Switzerland
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Marc Schmid
Marc Schmid
Bern University of Applied Science, Institute of Applied Laser, Photonics and Surface Technologies
, Pestalozzistrasse 20, 3400 Burgdorf, Switzerland
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Published Online:
September 01 2012
Citation
Beat Neuenschwander, Beat Jaeggi, Marc Schmid; September 23–27, 2012. "From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides." Proceedings of the ICALEO 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Anaheim, California, USA. (pp. pp. 959-968). ASME. https://doi.org/10.2351/1.5062570
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