We proposed a novel scheme for film deposition based on the pulsed laser deposition. We supply the liquid flow as target in and pulsed laser was irradiated it. Ablated species from the liquid-target was deposited on the substrate. In this method we can always obtain the constant target status and we can keep film quality as good for long time. First, we demonstrate to fabricate SnOx film using SnO2 colloidal solution. We are now trying to fabricate a hydroxyapatite films suing a colloidal hydroxyapatite solution.

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