This paper analyzes the interaction process between the laser beam and CCD devices. The damage effects of the CCD devices irradiated by the laser was observed. We give a comparative analysis of femtosecond laser pulses and the nanosecond laser pulse induced CCD failure threshold. The phenomena of saturation, cross-talk and totally damage were observed and the corresponding failure thresholds were measured, microscope was used to analyze the damage mechanism of CCD after experiments. The experimental results showed that the failure threshold of CCD was not only affected by the power density and the energy density but also by the peak power density, which was more important comparatively. This work will supply reference to the study on mutual effects with laser and CCD detectors.
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ICALEO 2009: 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
November 2–5, 2009
Orlando, Florida, USA
ISBN:
978-0-912035-59-8
PROCEEDINGS PAPER
New analysis on laser-induced damage mechanism of CCD device Available to Purchase
Jingjing Dai;
Jingjing Dai
Institute of Laser Engineering, Beijing University of Technology
Chaoyang District, Beijing, 100124, People’s Republic of China
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Zhiyong Wang
Zhiyong Wang
Institute of Laser Engineering, Beijing University of Technology
Chaoyang District, Beijing, 100124, People’s Republic of China
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Published Online:
November 01 2009
Citation
Jingjing Dai, Zhiyong Wang; November 2–5, 2009. "New analysis on laser-induced damage mechanism of CCD device." Proceedings of the ICALEO 2009: 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2009: 28th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Orlando, Florida, USA. (pp. pp. 258-261). ASME. https://doi.org/10.2351/1.5061562
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