We demonstrate a directly diode-pumped femtosecond regenerative amplifier with up to 2.5mJ pulse energy at a repetition rate of several kHz. Chirped pulse amplification is applied in order to eliminate non linear effects and to avoid damage of optical components during the amplification process. We use Ytterbium doped materials for femtosecond pulse amplification and high average power operation. The laser system is compact and robust source in order to answer the need of high energy and high average power for micro and nanomachining applications. Average power up to 15W at pulse repetition rates up to 100 kHz are also demonstrated with the same system. This wide operating range means that the laser can be used for many different processes.
Skip Nav Destination
ICALEO 2008: 27th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
October 20–23, 2008
Temecula, California, USA
ISBN:
978-0-912035-12-3
PROCEEDINGS PAPER
High average power ultrafast amplifier for micromachining applications Available to Purchase
Martin Delaigue;
Martin Delaigue
(1)
Amplitude Systèmes
, 6 allée du Doyen Georges Brus, 33600 Pessac, France
Search for other works by this author on:
Antoine Courjaud;
Antoine Courjaud
(1)
Amplitude Systèmes
, 6 allée du Doyen Georges Brus, 33600 Pessac, France
Search for other works by this author on:
Robert Braunschweig;
Robert Braunschweig
(2)
Amplitude Laser
, One Broadway, Cambridge MA 02141, USA
Search for other works by this author on:
Eric Mottay
Eric Mottay
(1)
Amplitude Systèmes
, 6 allée du Doyen Georges Brus, 33600 Pessac, France
Search for other works by this author on:
Published Online:
October 01 2008
Citation
Martin Delaigue, Antoine Courjaud, Robert Braunschweig, Eric Mottay; October 20–23, 2008. "High average power ultrafast amplifier for micromachining applications." Proceedings of the ICALEO 2008: 27th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2008: 27th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Temecula, California, USA. (pp. M803). ASME. https://doi.org/10.2351/1.5061399
Download citation file:
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.