The process of rapid laser patterning (RLP) of ITO thin films on glass has been adopted into mass production by the flat panel displays industry. This process involves high speed selective removal of thin films for the manufacture of transparent electrode structures and uses high average power, high peak power, nanosecond pulse duration Nd:YAG DPSS lasers. In this paper the laser patterning process and removal mechanism are described in detail with consideration given to how laser pulse characteristics influence features of the process. Subsequent issues such as the effect of the laser ablation plume, debris, substrate heating and redeposition of ITO residue are also considered.
REFERENCES
1.
J. P.
Beouf
: (2003
) Plasma Display Panels: physics, recent developments and key issues
, J. Phys. D.: Appl. Phys.
36
R53
–R79
2.
Henry
M.
, Wendland
J.
, Harrison
P.
, Hand
D.
, (2007
) Rapid laser patterning versus wet-etch lithography for flat panel display manufacture: a technical & commercial comparison
, in proceedings of ICALEO 2007
.3.
Venkat
, S.
, Dunsky
, C.
, (2006
) Laser Patterning of ITO in Flat Panel Display Manufacturing, Photon Processing in Microelectronics and Photonics V Photonics West, San Jose
, Proceedings of SPIE
Vol. 6106
, 610602
4.
Rumsby
, P. T.
, (2002
) Advanced laser tools for display device production on super large substrates
, IMID ’02 Digest
5.
Henry
, M.
, Harrison
, P.M.
, Wendland
, J.
, (2006
) Laser direct write of active thin-films on glass for industrial flat panel display manufacture
, Proceedings of the 4th International Congress on Laser Advanced Materials Processing
, Kyoto, Japan
, 142
6.
Takai
, M.
, Bollman
, D.
, Haberger
, K.
, (1994
) Maskless patterning of indium tin oxide layer for flat panel displays by diode-pumped Nd:YLF laser irradiation
, Applied Physics Letters
2560
– 2562
.7.
Yavas
, O.
, Takai
M.
, (1998
) High-speed maskless laser patterning of indium tin oxide thin films
, Applied Physics Letters
2558
– 2560
8.
Yavas
, O.
, Ochiai
, C.
, Takai
, M.
, (1999
) Substrate assisted laser patterning of indium tin oxide thin films
, Applied Physics A
, S875
– S878
9.
Yavas
, O.
, Takai
, M.
, (1999
) Effect of substrate absorption on the efficiency of laser patterning of indium tin oxide thin films
, Journal of Applied Physics
, 4207
– 4212
.10.
Henry
, M.
, Harrison
, P.
, Wendland
, J.
, (2006
) Nanoscale analysis of laser ablated thin films used in industrial manufacturing of flat panel displays
, in proceedings of ICALEO 2006
.11.
von Allmen
, M.
, Blatter
, M.
, (1998
) Laser-Beam Interactions with Materials
, Springer
, section 5.3.
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