The process of rapid laser patterning (RLP) of ITO thin films on glass has been adopted into mass production by the flat panel displays industry. This process involves high speed selective removal of thin films for the manufacture of transparent electrode structures and uses high average power, high peak power, nanosecond pulse duration Nd:YAG DPSS lasers. In this paper the laser patterning process and removal mechanism are described in detail with consideration given to how laser pulse characteristics influence features of the process. Subsequent issues such as the effect of the laser ablation plume, debris, substrate heating and redeposition of ITO residue are also considered.

Topics
Transition metal oxides, Laser ablation, Thin films
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2008
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