Application of dynamic maskless holographic lithography Available to Purchase

Maskless patterning techniques are increasingly implemented in materials research and manufacturing eliminating the need for masks or masters. Recent utilization of these techniques for biological patterning demonstrates the potential for successful application in various fields. We present a new lithographic process, dynamic maskless holographic lithography (DMHL), for the real-time configuration and arbitrary positioning of light intensity patterns using computer-generated phase holograms. We utilize a spatial light modulator (SLM), an electrically addressed diffractive optical element, to display phase holograms and direct light through an optical system. The phase holograms represent the Fourier transform of desired images and modulate incident light to reproduce the images in the focal plane of a microscope. The advantage of DMHL over other maskless techniques is the ability to perform serial and single-shot pattern transfer using a single instrument. The incorporation of a holographic offset also offers additional positioning and parallel processing capabilities. DMHL provides a rapidly adaptable and configurable system for many lithographic applications.