Improvement in printing quality and speed on inkjet printers requires a reduction in cross talk between ink cavities. To this end, cavities can be better produced with a high aspect ratio on thick silicon, which makes wafer handling easy. A silicon wafer is ablated with a pulsed laser beam to form a through-hole and then the wafer is dipped into a chemical bath to hollow out a cavity. Debris and deposit around and in those holes are washed away. Multi-beam parallel processing is essential for high throughput. Plural points on the wafer are drilled with a line of equally intense beams, which are generated by a diffractive beam splitter. The splitter’s performance affects process yield and cost. This hybrid process has been applied to inkjet cavity manufacture to render it competitive and cost-effective.
Skip Nav Destination
ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
October 29–November 1, 2007
Orlando, Florida, USA
ISBN:
978-0-912035-88-8
PROCEEDINGS PAPER
Multi-beam parallel processing and chemical finishing of silicon for microcavities in inkjet printer heads
Jun Amako
Jun Amako
Frontier Device Research Center, Seiko Epson Corporation
1010 Fujimi, Suwa, Nagano 399-0395, Japan
Search for other works by this author on:
Published Online:
October 01 2007
Citation
Jun Amako; October 29–November 1, 2007. "Multi-beam parallel processing and chemical finishing of silicon for microcavities in inkjet printer heads." Proceedings of the ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Orlando, Florida, USA. (pp. M701). ASME. https://doi.org/10.2351/1.5061149
Download citation file:
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.