We investigated the effective technique for debris suppression of a laser-produced tin plasma using a colloidal tin dioxide jet target, as well as the EUV emission and debris characteristics of the target. By using double pulse laser irradiation with an optimum delay of 100 ns, the EUV conversion efficiency of 1.2% at 13.5 nm was observed. The peak energy and intensity of ionic debris were simultaneously reduced by the double laser pulse irradiation. The peak kinetic energy of the singly-ionized tin ion was reduced from 9 to 3 keV, when an expanding low-density preplasma was produced. The dominant debris from a laser-produced tin plasma, which was deposited on a witness plate, was found to be oxidized tin (SnOx). By heating a witness plate at 100 °C, the deposited debris amount decreased to approximately one third.
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ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
October 29–November 1, 2007
Orlando, Florida, USA
ISBN:
978-0-912035-88-8
PROCEEDINGS PAPER
EUV and debris characteristics of a laser-produced tin plasma using a colloidal tin dioxide jet target
Masanori Kaku;
Masanori Kaku
1
Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazaki
, Gakuen Kibanadai Nishi 1-1, Miyazaki 889-2192, Japan
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Masahito Katto;
Masahito Katto
2
Cooperative Research Center, University of Miyazaki
, Gakuen Kibanadai Nishi 1-1, Miyazaki 889-2192, Japan
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Shoichi Kubodera
Shoichi Kubodera
1
Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazaki
, Gakuen Kibanadai Nishi 1-1, Miyazaki 889-2192, Japan
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Published Online:
October 01 2007
Citation
Masanori Kaku, Masahito Katto, Shoichi Kubodera; October 29–November 1, 2007. "EUV and debris characteristics of a laser-produced tin plasma using a colloidal tin dioxide jet target." Proceedings of the ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. ICALEO 2007: 26th International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Orlando, Florida, USA. (pp. M1201). ASME. https://doi.org/10.2351/1.5061119
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