The novel process of microstructures production by laser direct patterning

The improvement of pattern resolution for microsystems fabrication is certainly a proven method for increasing of micro and nanostructure density. Our novel laser technology applications could be applied for thin metal or alloy films on polymer substrates, which could be structured directly with the laser direct patterning process. The system concept is introduced and patterning results are discussed. Furthermore possible applications are described. So is possible to manufacture ultrafine conductive or reflective structures down to 15µm in an economical and environmentally friendly way. Increasing demand on the accuracy of microsystems and sensors require microstructures with lines and spaces of down of approximately 5-100µm. The processing model by UV laser ablation shown for direct patterning of metal or alloy films on polymer substrates. The processing flowchart and economic efficiency of laser patterning have been detailed presented on the paper. The results of experiments by analysis of answers of a variety of metal layers on different substrates with all the technical features of processing are specified. As particular applications of laser direct patterning we will present on the paper the new approach which was been developed too for prototyping of MCM-Lsd for two different processing as the gap cutting and line cutting process.