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Journal Articles

Effect of glow discharge treatment of substrates on parylene‐substrate adhesion

Ashok K. Sharma, H. Yasuda
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 994–998 (1982)
https://doi.org/10.1116/1.571880
Published: November 1982
View article titled, Effect of glow discharge treatment of substrates on parylene‐substrate adhesion
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Journal Articles

Model of bias sputtering in a dc‐triode configuration applied to the production of Pd films

P. Ziemann, E. Kay
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 828–832 (1982)
https://doi.org/10.1116/1.571831
Published: September 1982
View article titled, Model of bias sputtering in a dc‐triode configuration applied to the production of Pd films
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Journal Articles

Reduction of surface states on GaAs by the plasma growth of oxyfluorides

R. K. Ahrenkiel, L. L. Kazmerski, P. J. Ireland, O. Jamjoum, P. E. Russell, D. Dunlavy, R. S. Wagner, S. Pattillo, T. Jervis
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 434–437 (1982)
https://doi.org/10.1116/1.571672
Published: July 1982
View article titled, Reduction of surface states on GaAs by the plasma growth of oxyfluorides
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Journal Articles

Ion–surface interactions during vapor phase crystal growth by sputtering, MBE, and plasma‐enhanced CVD: Applications to semiconductors

J. E. Greene, S. A. Barnett
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 285–302 (1982)
https://doi.org/10.1116/1.571767
Published: July 1982
View article titled, Ion–surface interactions during vapor phase crystal growth by sputtering, MBE, and plasma‐enhanced CVD: Applications to semiconductors
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Journal Articles

The LLNL tandem mirror experiment (TMX) upgrade vacuum system

W. L. Pickles, A. K. Chargin, R. P. Drake, A. L. Hunt, D. D. Lang, J. J. Murphy, P. Poulsen, T. C. Simonen, T. H. Batzer, T. P. Stack, R. L. Wong
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 1177–1181 (1982)
https://doi.org/10.1116/1.571513
Published: April 1982
View article titled, The LLNL tandem mirror experiment (TMX) upgrade vacuum system
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Journal Articles

Effect of hydrogen glow discharge conditioning on Zr/Al getter pumps

H. F. Dylla, J. L. Cecchi, M. Ulrickson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1111–1113 (1981)
https://doi.org/10.1116/1.570850
Published: April 1981
View article titled, Effect of hydrogen glow discharge conditioning on Zr/Al getter pumps
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Journal Articles

Hydrogen isotope analysis by quadrupole mass spectrometry

R. E. Ellefson, W. E. Moddeman, H. F. Dylla
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1062–1067 (1981)
https://doi.org/10.1116/1.570885
Published: April 1981
View article titled, Hydrogen isotope analysis by quadrupole mass spectrometry
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Journal Articles

Control system dynamics using glow discharge mass spectroscopy for thin film sputtering

B. F. T. Bolker, T. C. Tisone, T. S. Latos
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 328–334 (1981)
https://doi.org/10.1116/1.570752
Published: March 1981
View article titled, Control system dynamics using glow discharge mass spectroscopy for thin film sputtering
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Journal Articles

Survey of ion plating sources

Talivaldis Spalvins
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 315–321 (1980)
https://doi.org/10.1116/1.570377
Published: January 1980
View article titled, Survey of ion plating sources
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Journal Articles

X‐ray photoelectron spectroscopy (XPS) studies of oxygen and carbon bonding to tokamak walls

Ph. Staib, H. F. Dylla, S. M. Rossnagel
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 291–293 (1980)
https://doi.org/10.1116/1.570415
Published: January 1980
View article titled, X‐ray photoelectron spectroscopy (XPS) studies of oxygen and carbon bonding to tokamak walls
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Journal Articles

Glow discharge conditioning of the PDX vacuum vessel

H. F. Dylla, S. A. Cohen, S. M. Rossnagel, G. M. McCracken, Ph. Staib
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 286–290 (1980)
https://doi.org/10.1116/1.570414
Published: January 1980
View article titled, Glow discharge conditioning of the PDX vacuum vessel
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Journal Articles

Closed loop control of thin film sputter deposition processes using glow discharge mass spectroscopy

T. C. Tisone, B. F. T. Bolker, T. S. Latos
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 415–419 (1980)
https://doi.org/10.1116/1.570470
Published: January 1980
View article titled, Closed loop control of thin film sputter deposition processes using glow discharge mass spectroscopy
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Journal Articles

Plasma etching—A discussion of mechanisms

J. W. Coburn, Harold F. Winters
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 391–403 (1979)
https://doi.org/10.1116/1.569958
Published: March 1979
View article titled, Plasma etching—A discussion of mechanisms
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Journal Articles

Plasma‐promoted deposition of thin inorganic films

Myron J. Rand
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 420–427 (1979)
https://doi.org/10.1116/1.569965
Published: March 1979
View article titled, Plasma‐promoted deposition of thin inorganic films
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Journal Articles

Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter deposition

J. E. Greene
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 15, 1718–1729 (1978)
https://doi.org/10.1116/1.569834
Published: September 1978
View article titled, Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter deposition
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Journal Articles

In situ conditioning for proton storage ring vacuum systems

D. Blechschmidt
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 15, 1175–1181 (1978)
https://doi.org/10.1116/1.569530
Published: May 1978
View article titled, <em>I</em><em>n</em> <em>s</em><em>i</em><em>t</em><em>u</em> conditioning for proton storage ring vacuum systems
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Journal Articles

The rf glow‐discharge sputtering model

J. S. Logan, J. H. Keller, R. G. Simmons
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 14, 92–97 (1977)
https://doi.org/10.1116/1.569181
Published: January 1977
View article titled, The rf glow‐discharge sputtering model
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Journal Articles

Plasma etching in integrated circuit manufacture—A review

R. G. Poulsen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 14, 266–274 (1977)
https://doi.org/10.1116/1.569137
Published: January 1977
View article titled, Plasma etching in integrated circuit manufacture—A review
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Journal Articles

Analytical approach to ball‐bearing surface chemistry

Elaine G. Shafrin, James S. Murday
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 14, 246–253 (1977)
https://doi.org/10.1116/1.569133
Published: January 1977
View article titled, Analytical approach to ball‐bearing surface chemistry
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Journal Articles

Copper/oxygen glow‐discharge spectrometry

A. J. Purdes, B. F. T. Bolker, J. D. Bucci, T. C. Tisone
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 14, 98–101 (1977)
https://doi.org/10.1116/1.569182
Published: January 1977
View article titled, Copper/oxygen glow‐discharge spectrometry
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