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Journal Articles

Cryopump regeneration studies

R. C. Longsworth, G. E. Bonney
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 1022–1027 (1982)
https://doi.org/10.1116/1.571855
Published: November 1982
View articletitled, Cryopump regeneration studies
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Journal Articles

Effect of glow discharge treatment of substrates on parylene‐substrate adhesion

Ashok K. Sharma, H. Yasuda
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 994–998 (1982)
https://doi.org/10.1116/1.571880
Published: November 1982
View articletitled, Effect of glow discharge treatment of substrates on parylene‐substrate adhesion
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Journal Articles

The effect of the atomic incident angle upon the microstructure of thick beryllium deposits produced by physical vapor deposition

T. G. Nieh, R. F. Karlak, A. E. Vidoz
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 980–985 (1982)
https://doi.org/10.1116/1.571878
Published: November 1982
View articletitled, The effect of the atomic incident angle upon the microstructure of thick beryllium deposits produced by physical vapor deposition
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Journal Articles

Auger and photoelectron line energy relationships in aluminum–oxygen and silicon–oxygen compounds

C. D. Wagner, D. E. Passoja, H. F. Hillery, T. G. Kinisky, H. A. Six, W. T. Jansen, J. A. Taylor
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 933–944 (1982)
https://doi.org/10.1116/1.571870
Published: November 1982
View articletitled, Auger and photoelectron line energy relationships in aluminum–oxygen and silicon–oxygen compounds
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Journal Articles

Chlorine and hydrogen chloride on clean and oxygen‐covered Fe(100): Bonding and reactions

N. C. Debnath, Alfred B. Anderson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 945–951 (1982)
https://doi.org/10.1116/1.571871
Published: November 1982
View articletitled, Chlorine and hydrogen chloride on clean and oxygen‐covered Fe(100): Bonding and reactions
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Journal Articles

Electron‐beam lithography three‐mark silicon automatic registration and its capabilities for process distortion compensation

Eric Tobias, Allen Carroll
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 999–1004 (1982)
https://doi.org/10.1116/1.571881
Published: November 1982
View articletitled, Electron‐beam lithography three‐mark silicon automatic registration and its capabilities for process distortion compensation
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Journal Articles

Laser diagnostics of plasma etching: Measurement of Cl+2 in a chlorine discharge

V. M. Donnelly, D. L. Flamm, G. Collins
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 817–823 (1982)
https://doi.org/10.1116/1.571829
Published: September 1982
View articletitled, Laser diagnostics of plasma etching: Measurement of Cl+2 in a chlorine discharge
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Journal Articles

The fabrication and use of silicon and gallium arsenide ion source extraction grids

J. L. Speidell, J. M. E. Harper, J. J. Cuomo, A. W. Kleinsasser, H. R. Kaufman, A. H. Tuttle
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 824–827 (1982)
https://doi.org/10.1116/1.571830
Published: September 1982
View articletitled, The fabrication and use of silicon and gallium arsenide ion source extraction grids
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Journal Articles

Anodization of aluminum wire for ultrahigh vacuum electromagnetic coils

John R. Barthel, John B. Hudson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 901–902 (1982)
https://doi.org/10.1116/1.571848
Published: September 1982
View articletitled, Anodization of aluminum wire for ultrahigh vacuum electromagnetic coils
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Journal Articles

Effects of argon pressure on the structure and properties of dc planar‐magnetron‐sputtered metal and semiconductor films with implications for solar energy applications

S. Craig, G. L. Harding
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 833–837 (1982)
https://doi.org/10.1116/1.571832
Published: September 1982
View articletitled, Effects of argon pressure on the structure and properties of dc planar‐magnetron‐sputtered metal and semiconductor films with implications for solar energy applications
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Journal Articles

Factors determining the compound phases formed by oxygen or nitrogen implantation in metals

Roger Kelly
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 778–789 (1982)
https://doi.org/10.1116/1.571825
Published: September 1982
View articletitled, Factors determining the compound phases formed by oxygen or nitrogen implantation in metals
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Journal Articles

Study of grain boundary diffusion of potassium in gold films using a clean, controlled, and localized source of alkali atoms

M. H. Farías, J. L. Peña, F. Sánchez‐Sinencio
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 853–857 (1982)
https://doi.org/10.1116/1.571835
Published: September 1982
View articletitled, Study of grain boundary diffusion of potassium in gold films using a clean, controlled, and localized source of alkali atoms
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Journal Articles

Initial stages of anodic oxidation of GaAs

W. H. Makky, F. Cabrera, K. M. Geib, C. W. Wilmsen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 417–421 (1982)
https://doi.org/10.1116/1.571668
Published: July 1982
View articletitled, Initial stages of anodic oxidation of GaAs
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Journal Articles

Peroxide etch chemistry on 〈100〉In0.53Ga0.47As

D. E. Aspnes, H. J. Stocker
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 413–416 (1982)
https://doi.org/10.1116/1.571667
Published: July 1982
View articletitled, Peroxide etch chemistry on 〈100〉In0.53Ga0.47As
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Journal Articles

Chemical control of recombination at grain boundaries and liquid interfaces: Electrical power and hydrogen generating photoelectrochemical cells

A. Heller
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 559–561 (1982)
https://doi.org/10.1116/1.571762
Published: July 1982
View articletitled, Chemical control of recombination at grain boundaries and liquid interfaces: Electrical power and hydrogen generating photoelectrochemical cells
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Journal Articles

An investigation of the interface electronics structure of Si–SiO2 junctions

S. Ciraci, Ş. Ellialtioğlu, Ş. Erkoç
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 402–404 (1982)
https://doi.org/10.1116/1.571664
Published: July 1982
View articletitled, An investigation of the interface electronics structure of Si–SiO2 junctions
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Journal Articles

Dry development of ion beam exposed PMMA resist

I. Adesida, J. D. Chinn, L. Rathbun, E. D. Wolf
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 666–671 (1982)
https://doi.org/10.1116/1.571810
Published: July 1982
View articletitled, Dry development of ion beam exposed PMMA resist
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Journal Articles

Thermal removal of surface carbon from GaAs substrate used in molecular beam epitaxy

Chin‐An Chang
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 663–665 (1982)
https://doi.org/10.1116/1.571809
Published: July 1982
View articletitled, Thermal removal of surface carbon from GaAs substrate used in molecular beam epitaxy
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Journal Articles

Effect of low‐intensity laser radiation during oxidation of the GaAs(110) surface

W. G. Petro, I. Hino, S. Eglash, I. Lindau, C. Y. Su, W. E. Spicer
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 405–408 (1982)
https://doi.org/10.1116/1.571665
Published: July 1982
View articletitled, Effect of low‐intensity laser radiation during oxidation of the GaAs(110) surface
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Journal Articles

Photoemission and photon‐stimulated ion desorption studies of diamond(111): Hydrogen

B. B. Pate, M. H. Hecht, C. Binns, I. Lindau, W. E. Spicer
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 364–367 (1982)
https://doi.org/10.1116/1.571781
Published: July 1982
View articletitled, Photoemission and photon‐stimulated ion desorption studies of diamond(111): Hydrogen
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