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Journal Articles

Growth and surface properties of lanthanum hexaboride crystals

Toru Inoue, Mitsuru Nakada, Takahiko Uozumi, Eizi Sugata
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 952–956 (1982)
https://doi.org/10.1116/1.571872
Published: November 1982
View article titled, Growth and surface properties of lanthanum hexaboride crystals
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Journal Articles

Mask fabrication for VLSI using an electron beam exposure system

Y. Watakabe, T. Kato, A. Shigetomi, H. Morimoto
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 1005–1011 (1982)
https://doi.org/10.1116/1.571852
Published: November 1982
View article titled, Mask fabrication for VLSI using an electron beam exposure system
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Journal Articles

Electron optical column for high‐speed electron beam delineator: VL‐R2

M. Nakasuji, H. Wada, S. Sano
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 872–878 (1982)
https://doi.org/10.1116/1.571838
Published: September 1982
View article titled, Electron optical column for high‐speed electron beam delineator: VL‐R2
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Journal Articles

Study of space–charge effect by computer

Tateaki Sasaki
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 695–706 (1982)
https://doi.org/10.1116/1.571816
Published: July 1982
View article titled, Study of space–charge effect by computer
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Journal Articles

Investigation of GaAs field‐effect transistor interfaces using pulsed electron beam excitation

L. D. Flesner, A. K. Nedoluha, H. H. Wieder
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 463–466 (1982)
https://doi.org/10.1116/1.571679
Published: July 1982
View article titled, Investigation of GaAs field‐effect transistor interfaces using pulsed electron beam excitation
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Journal Articles

Grain boundary diffusion of phosphorus in polycrystalline silicon

P. H. Holloway
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 19–22 (1982)
https://doi.org/10.1116/1.571713
Published: May 1982
View article titled, Grain boundary diffusion of phosphorus in polycrystalline silicon
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Journal Articles

General model of sodium desorption and diffusion during electron bombardment of glass

F. Ohuchi, P. H. Holloway
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 863–867 (1982)
https://doi.org/10.1116/1.571367
Published: March 1982
View article titled, General model of sodium desorption and diffusion during electron bombardment of glass
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Journal Articles

Unique semiconductor materials and structures produced by laser and electron beams

W. L. Brown
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 734–737 (1982)
https://doi.org/10.1116/1.571443
Published: March 1982
View article titled, Unique semiconductor materials and structures produced by laser and electron beams
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Journal Articles

Magnetron sputtering with additional ionization effect by electron beam

R. Adachi, K. Takeshita
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 98–99 (1982)
https://doi.org/10.1116/1.571320
Published: January 1982
View article titled, Magnetron sputtering with additional ionization effect by electron beam
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Journal Articles

A new type pattern generator applied to the electron‐beam exposure system

An De‐xiang, Wang Jian‐kun, Qiu Pei‐yong
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 975–978 (1981)
https://doi.org/10.1116/1.571203
Published: November 1981
View article titled, A new type pattern generator applied to the electron‐beam exposure system
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Journal Articles

Accuracy of image positioning in an electron beam proximity printer

P. Nehmiz, H. Bohlen, J. Greschner
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 971–974 (1981)
https://doi.org/10.1116/1.571202
Published: November 1981
View article titled, Accuracy of image positioning in an electron beam proximity printer
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Journal Articles

UV hardening of photo‐ and electron beam resist patterns

H. Hiraoka, J. Pacansky
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1132–1135 (1981)
https://doi.org/10.1116/1.571183
Published: November 1981
View article titled, UV hardening of photo‐ and electron beam resist patterns
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Journal Articles

Electron beam direct writing of capacitor coupled GaAs FET logic circuits

C. Dix, P. G. Flavin, P. Hendy, M. E. Jones
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 911–915 (1981)
https://doi.org/10.1116/1.571188
Published: November 1981
View article titled, Electron beam direct writing of capacitor coupled GaAs FET logic circuits
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Journal Articles

Monte Carlo modeling of current distribution in shaped electron beams

P. S. Dayan, G. A. C. Jones
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1094–1097 (1981)
https://doi.org/10.1116/1.571175
Published: November 1981
View article titled, Monte Carlo modeling of current distribution in shaped electron beams
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Journal Articles

Deep‐UV photoresists: Poly(methyl methacrylate‐co‐indenone)

R. L. Hartless, E. A. Chandross
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1333–1337 (1981)
https://doi.org/10.1116/1.571271
Published: November 1981
View article titled, Deep‐UV photoresists: Poly(methyl methacrylate‐co‐indenone)
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Journal Articles

An approach to correct the proximity effect in electron beam proximity printing

P. Nehmiz, H. Bohlen, J. Greschner, E. Bretscher, P. Vettiger
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1291–1295 (1981)
https://doi.org/10.1116/1.571262
Published: November 1981
View article titled, An approach to correct the proximity effect in electron beam proximity printing
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Journal Articles

Contactless electrical testing of large area specimens using electron beams

H. C. Pfeiffer, G. O. Langner, W. Stickel, R. A. Simpson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1014–1018 (1981)
https://doi.org/10.1116/1.571159
Published: November 1981
View article titled, Contactless electrical testing of large area specimens using electron beams
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Journal Articles

Current distribution in shaped e‐beams

V.R.M. Rao, G.A.C. Jones, H. Ahmed
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1098–1102 (1981)
https://doi.org/10.1116/1.571176
Published: November 1981
View article titled, Current distribution in shaped e‐beams
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Journal Articles

Graphic data editor for Cambridge e beam

H. M. Zimmermann
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1007–1009 (1981)
https://doi.org/10.1116/1.571157
Published: November 1981
View article titled, Graphic data editor for Cambridge e beam
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Journal Articles

Oblique deposition enhanced sensitivity in electron beam exposed g‐GexSe1−x inorganic resist

K. Balasubramanyam, Arthur L. Ruoff
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1374–1378 (1981)
https://doi.org/10.1116/1.571213
Published: November 1981
View article titled, Oblique deposition enhanced sensitivity in electron beam exposed <em>g</em>‐Ge<sub><em>x</em></sub>Se<sub>1−<em>x</em></sub> inorganic resist
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