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Journal Articles

Recent developments in two‐level resist technology

B. F. Griffing
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1423–1428 (1981)
https://doi.org/10.1116/1.571223
Published: November 1981
View article titled, Recent developments in two‐level resist technology
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Journal Articles

Application of zone plates to alignment in microlithography

M. Feldman, A. D. White, D. L. White
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1224–1228 (1981)
https://doi.org/10.1116/1.571249
Published: November 1981
View article titled, Application of zone plates to alignment in microlithography
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Journal Articles

An electron‐beam/optical‐hybrid lithography approach to submicrometer electronic devices

J. C. Potosky, A. J. Higgins, S. T. Hoelke, R. G. Imerson, F. F. Kinoshita, R. L. Maddox, J. P. Reekstin
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 924–926 (1981)
https://doi.org/10.1116/1.571191
Published: November 1981
View article titled, An electron‐beam/optical‐hybrid lithography approach to submicrometer electronic devices
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Journal Articles

EL‐3: A high throughput, high resolution e‐beam lithography tool

R. D. Moore, G. A. Caccoma, H. C. Pfeiffer, E. V. Weber, O. C. Woodard
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 950–952 (1981)
https://doi.org/10.1116/1.571197
Published: November 1981
View article titled, EL‐3: A high throughput, high resolution e‐beam lithography tool
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Journal Articles

A new conformal dry‐etch technique for submicrometer structuresa)

Ma Jun‐Ru, Shen Kuo‐Hsiung, E. D. Wolf, T. E. Everhart
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1385–1389 (1981)
https://doi.org/10.1116/1.571215
Published: November 1981
View article titled, A new conformal dry‐etch technique for submicrometer structures<sup>a)</sup>
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Journal Articles

Ion projection microlithography for submicron device fabrication

G. Stengl, R. Kaitna, H. Löschner, R. Rieder, P. Wolf, R. Sacher
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1164–1165 (1981)
https://doi.org/10.1116/1.571235
Published: November 1981
View article titled, Ion projection microlithography for submicron device fabrication
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Journal Articles

The use of bias in electron beam lithography for improved profile quality and linewidth control

M. G. Rosenfield, A. R. Neureuther, C. H. Ting
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1242–1247 (1981)
https://doi.org/10.1116/1.571253
Published: November 1981
View article titled, The use of bias in electron beam lithography for improved profile quality and linewidth control
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Journal Articles

A simple method for fabricating submicron lines

J. L. Speidell
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 693–695 (1981)
https://doi.org/10.1116/1.571087
Published: September 1981
View article titled, A simple method for fabricating submicron lines
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Journal Articles

Pattern profile control utilizing shadowing effect in oblique ion‐beam etching

H. Gokan, S. Esho
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 28–31 (1981)
https://doi.org/10.1116/1.571011
Published: May 1981
View article titled, Pattern profile control utilizing shadowing effect in oblique ion‐beam etching
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Journal Articles

A gap reduction technique for obtaining submicron geometries utilizing redeposition effect

H. Gokan, S. Esho
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 32–35 (1981)
https://doi.org/10.1116/1.571012
Published: May 1981
View article titled, A gap reduction technique for obtaining submicron geometries utilizing redeposition effect
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Journal Articles

Studies on an electron‐beam mask‐defect inspection system

Y. Wada, Y. Hisamoto, K. Mizukami, M. Migitaka
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 36–39 (1981)
https://doi.org/10.1116/1.571013
Published: May 1981
View article titled, Studies on an electron‐beam mask‐defect inspection system
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Journal Articles

Gas plasma etching of ion implanted chromium films

T. Yamazaki, Y. Suzuki, H. Nakata
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1348–1350 (1980)
https://doi.org/10.1116/1.570668
Published: November 1980
View article titled, Gas plasma etching of ion implanted chromium films
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Journal Articles

Plasma etching characteristics of chromium film and its novel etching mode

H. Nakata, K. Nishioka, H. Abe
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1351–1357 (1980)
https://doi.org/10.1116/1.570669
Published: November 1980
View article titled, Plasma etching characteristics of chromium film and its novel etching mode
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Journal Articles

Submicron optical lithography using an inorganic resist/polymer bilevel scheme

K. L. Tai, R. G. Vadimsky, C. T. Kemmerer, J. S. Wagner, V. E. Lamberti, A. G. Timko
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1169–1176 (1980)
https://doi.org/10.1116/1.570634
Published: September 1980
View article titled, Submicron optical lithography using an inorganic resist/polymer bilevel scheme
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Journal Articles

Optical imaging for microfabrication

J. H. Bruning
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1147–1155 (1980)
https://doi.org/10.1116/1.570631
Published: September 1980
View article titled, Optical imaging for microfabrication
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Journal Articles

Microfabrication at the University of Cincinnati

A. Naumaan, K. P. Roenker, J. T. Boyd
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 69–71 (1980)
https://doi.org/10.1116/1.570507
Published: January 1980
View article titled, Microfabrication at the University of Cincinnati
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Journal Articles

Bilevel high resolution photolithographic technique for use with wafers with stepped and/or reflecting surfaces

K. L. Tai, W. R. Sinclair, R. G. Vadimsky, J. M. Moran, M. J. Rand
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1977–1979 (1979)
https://doi.org/10.1116/1.570370
Published: November 1979
View article titled, Bilevel high resolution photolithographic technique for use with wafers with stepped and/or reflecting surfaces
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Journal Articles

Short channel n‐MOS devices via combined e‐beam and photolithographic processing

R. C. Henderson, J. G. Nash
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1654–1657 (1979)
https://doi.org/10.1116/1.570264
Published: November 1979
View article titled, Short channel <em>n</em>‐MOS devices via combined <em>e</em>‐beam and photolithographic processing
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Journal Articles

High resolution bubble patterns obtained by electron image projection

T. W. Bril, J. T. Snijders
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1665–1667 (1979)
https://doi.org/10.1116/1.570267
Published: November 1979
View article titled, High resolution bubble patterns obtained by electron image projection
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Journal Articles

Inorganic resist for dry processing and dopant applications

M. S. Chang, T. W. Hou, J. T. Chen, K. D. Kolwicz, J. N. Zemel
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1973–1976 (1979)
https://doi.org/10.1116/1.570369
Published: November 1979
View article titled, Inorganic resist for dry processing and dopant applications
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