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Journal Articles

Modeling ion beam milling

D. W. Youngner, C. M. Haynes
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 677–680 (1982)
https://doi.org/10.1116/1.571812
Published: July 1982
View article titled, Modeling ion beam milling
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Journal Articles

A new method for the batch production of micro‐Fresnel zone plates

D. Glocker, R. Wiseman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 1098–1100 (1982)
https://doi.org/10.1116/1.571576
Published: April 1982
View article titled, A new method for the batch production of micro‐Fresnel zone plates
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Journal Articles

Polysilicon etching and profile control in a CCl4–O2 plasma

C. S. Korman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 476–479 (1982)
https://doi.org/10.1116/1.571339
Published: March 1982
View article titled, Polysilicon etching and profile control in a CCl<sub>4</sub>–O<sub>2</sub> plasma
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Journal Articles

Reactive ion etching of aluminum using SiCl4

M. Sato, H. Nakamura
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 186–190 (1982)
https://doi.org/10.1116/1.571354
Published: February 1982
View article titled, Reactive ion etching of aluminum using SiCl<sub>4</sub>
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Journal Articles

The composition of oxides grown on PbInAu films by rf oxidation

J. M. Baker, J. H. Magerlein, R. W. Johnson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 175–181 (1982)
https://doi.org/10.1116/1.571352
Published: February 1982
View article titled, The composition of oxides grown on PbInAu films by rf oxidation
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Journal Articles

Fabrication of thick narrow electrodes on concentrator solar cells

A. Blakers, P. B. Kosel, M. R. Willison, M. A. Green
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 13–15 (1982)
https://doi.org/10.1116/1.571300
Published: January 1982
View article titled, Fabrication of thick narrow electrodes on concentrator solar cells
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Journal Articles

Recent developments in two‐level resist technology

B. F. Griffing
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1423–1428 (1981)
https://doi.org/10.1116/1.571223
Published: November 1981
View article titled, Recent developments in two‐level resist technology
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Journal Articles

A novel approach to o‐nitrobenzyl photochemistry for resists

E. Reichmanis, C. W. Wilkins, Jr., E. A. Chandross
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1338–1342 (1981)
https://doi.org/10.1116/1.571272
Published: November 1981
View article titled, A novel approach to <em>o</em>‐nitrobenzyl photochemistry for resists
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Journal Articles

Deep‐UV photoresists: Poly(methyl methacrylate‐co‐indenone)

R. L. Hartless, E. A. Chandross
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1333–1337 (1981)
https://doi.org/10.1116/1.571271
Published: November 1981
View article titled, Deep‐UV photoresists: Poly(methyl methacrylate‐co‐indenone)
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Journal Articles

Plasma pretreatment to improve resist properties by reduction of resist flow during postbake

J. M. Moran, G. N. Taylor
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1127–1131 (1981)
https://doi.org/10.1116/1.571182
Published: November 1981
View article titled, Plasma pretreatment to improve resist properties by reduction of resist flow during postbake
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Journal Articles

Submicroscopic pattern replication with visible light

U. Ch. Fischer, H. P. Zingsheim
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 881–885 (1981)
https://doi.org/10.1116/1.571227
Published: November 1981
View article titled, Submicroscopic pattern replication with visible light
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Journal Articles

Oxygen plasma etching of thick polymer layers

I. S. Goldstein, F. Kalk
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 743–747 (1981)
https://doi.org/10.1116/1.571143
Published: September 1981
View article titled, Oxygen plasma etching of thick polymer layers
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Journal Articles

A simple method for fabricating submicron lines

J. L. Speidell
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 693–695 (1981)
https://doi.org/10.1116/1.571087
Published: September 1981
View article titled, A simple method for fabricating submicron lines
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Journal Articles

Pattern profile control utilizing shadowing effect in oblique ion‐beam etching

H. Gokan, S. Esho
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 28–31 (1981)
https://doi.org/10.1116/1.571011
Published: May 1981
View article titled, Pattern profile control utilizing shadowing effect in oblique ion‐beam etching
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Journal Articles

A gap reduction technique for obtaining submicron geometries utilizing redeposition effect

H. Gokan, S. Esho
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 32–35 (1981)
https://doi.org/10.1116/1.571012
Published: May 1981
View article titled, A gap reduction technique for obtaining submicron geometries utilizing redeposition effect
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Journal Articles

Microfabrication of hemispherical shells for laser fusion targets

I. S. Goldstein, F. Kalk, J. Trovato
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1175–1178 (1981)
https://doi.org/10.1116/1.570865
Published: April 1981
View article titled, Microfabrication of hemispherical shells for laser fusion targets
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Journal Articles

Submicron optical lithography using an inorganic resist/polymer bilevel scheme

K. L. Tai, R. G. Vadimsky, C. T. Kemmerer, J. S. Wagner, V. E. Lamberti, A. G. Timko
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1169–1176 (1980)
https://doi.org/10.1116/1.570634
Published: September 1980
View article titled, Submicron optical lithography using an inorganic resist/polymer bilevel scheme
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Journal Articles

Optical imaging for microfabrication

J. H. Bruning
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1147–1155 (1980)
https://doi.org/10.1116/1.570631
Published: September 1980
View article titled, Optical imaging for microfabrication
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Journal Articles

Approach to the measurement of short wavelength absorption properties of photoresists

Paul W. Bohn, James W. Taylor, Henry Guckel
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 735–738 (1980)
https://doi.org/10.1116/1.570551
Published: May 1980
View article titled, Approach to the measurement of short wavelength absorption properties of photoresists
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Journal Articles

Anisotropic plasma etching of polysilicon

C. J. Mogab, H. J. Levinstein
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 721–730 (1980)
https://doi.org/10.1116/1.570549
Published: May 1980
View article titled, Anisotropic plasma etching of polysilicon
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