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Journal Articles

Laser‐enhanced gas–surface chemistry: Basic processes and applications

T. J. Chuang
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 798–806 (1982)
https://doi.org/10.1116/1.571827
Published: September 1982
View article titled, Laser‐enhanced gas–surface chemistry: Basic processes and applications
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Journal Articles

Ion beam sputter‐deposited diamondlike films

Bruce A. Banks, Sharon K. Rutledge
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 807–814 (1982)
https://doi.org/10.1116/1.571828
Published: September 1982
View article titled, Ion beam sputter‐deposited diamondlike films
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Journal Articles

Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications

J. M. E. Harper, J. J. Cuomo, H. R. Kaufman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 737–756 (1982)
https://doi.org/10.1116/1.571820
Published: September 1982
View article titled, Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications
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Journal Articles

Modeling ion beam milling

D. W. Youngner, C. M. Haynes
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 677–680 (1982)
https://doi.org/10.1116/1.571812
Published: July 1982
View article titled, Modeling ion beam milling
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Journal Articles

High resolution trilevel resist

H. Namatsu, Y. Ozaki, K. Hirata
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 672–676 (1982)
https://doi.org/10.1116/1.571811
Published: July 1982
View article titled, High resolution trilevel resist
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Journal Articles

Dry development of ion beam exposed PMMA resist

I. Adesida, J. D. Chinn, L. Rathbun, E. D. Wolf
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 666–671 (1982)
https://doi.org/10.1116/1.571810
Published: July 1982
View article titled, Dry development of ion beam exposed PMMA resist
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Journal Articles

Thermal removal of surface carbon from GaAs substrate used in molecular beam epitaxy

Chin‐An Chang
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 663–665 (1982)
https://doi.org/10.1116/1.571809
Published: July 1982
View article titled, Thermal removal of surface carbon from GaAs substrate used in molecular beam epitaxy
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Journal Articles

A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si

M. Miyamura, O. Tsukakoshi, S. Komiya
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 986–988 (1982)
https://doi.org/10.1116/1.571659
Published: April 1982
View article titled, A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO<sub>2</sub> and Si
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Journal Articles

A new method for the batch production of micro‐Fresnel zone plates

D. Glocker, R. Wiseman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 1098–1100 (1982)
https://doi.org/10.1116/1.571576
Published: April 1982
View article titled, A new method for the batch production of micro‐Fresnel zone plates
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Journal Articles

Implementation of adaptive process control to a dry etching process

F. J. Bresnock, Th. Stumpf
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 1027–1030 (1982)
https://doi.org/10.1116/1.571534
Published: April 1982
View article titled, Implementation of adaptive process control to a dry etching process
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Journal Articles

Composition and electron stress effects in silicon nitride thin films made by thermal growth and chemical etching of LPCVD MNOS structures as studied by x‐ray photoelectron spectroscopy (XPS)

J. A. Wurzbach, F. J. Grunthaner, J. Maserjian
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 962–965 (1982)
https://doi.org/10.1116/1.571653
Published: April 1982
View article titled, Composition and electron stress effects in silicon nitride thin films made by thermal growth and chemical etching of LPCVD MNOS structures as studied by x‐ray photoelectron spectroscopy (XPS)
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Journal Articles

Ion beam assisted etching for GaAs device applications

G. A. Lincoln, M. W. Geis, L. J. Mahoney, A. Chu, B. A. Vojak, K. B. Nichols, W. J. Piacentini, N. Efremow, W. T. Lindley
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 786–789 (1982)
https://doi.org/10.1116/1.571483
Published: March 1982
View article titled, Ion beam assisted etching for GaAs device applications
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Journal Articles

Textured surfaces: Optical storage and other applications

H. G. Craighead, R. E. Howard, J. E. Sweeney, D. M. Tennant
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 316–319 (1982)
https://doi.org/10.1116/1.571291
Published: March 1982
View article titled, Textured surfaces: Optical storage and other applications
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Journal Articles

Reactive ion etching of aluminum using SiCl4

M. Sato, H. Nakamura
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 186–190 (1982)
https://doi.org/10.1116/1.571354
Published: February 1982
View article titled, Reactive ion etching of aluminum using SiCl<sub>4</sub>
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Journal Articles

Fabrication of thick narrow electrodes on concentrator solar cells

A. Blakers, P. B. Kosel, M. R. Willison, M. A. Green
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 13–15 (1982)
https://doi.org/10.1116/1.571300
Published: January 1982
View article titled, Fabrication of thick narrow electrodes on concentrator solar cells
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Journal Articles

Fabrication process for surface acoustic wave filters having 0.5 μm finger period electrodes

M. Itoh, H. Gokan, S. Esho, K. Asakawa
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 21–25 (1982)
https://doi.org/10.1116/1.571303
Published: January 1982
View article titled, Fabrication process for surface acoustic wave filters having 0.5 μm finger period electrodes
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Journal Articles

Hydrogen plasma etching of semiconductors and their oxides

R. P. H. Chang, C. C. Chang, S. Darack
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 45–50 (1982)
https://doi.org/10.1116/1.571307
Published: January 1982
View article titled, Hydrogen plasma etching of semiconductors and their oxides
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Journal Articles

UV hardening of photo‐ and electron beam resist patterns

H. Hiraoka, J. Pacansky
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1132–1135 (1981)
https://doi.org/10.1116/1.571183
Published: November 1981
View article titled, UV hardening of photo‐ and electron beam resist patterns
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Journal Articles

Application of ≊100 Å linewidth structures fabricated by shadowing techniques

D. C. Flanders, Alice E. White
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 892–896 (1981)
https://doi.org/10.1116/1.571229
Published: November 1981
View article titled, Application of ≊100 Å linewidth structures fabricated by shadowing techniques
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Journal Articles

Microstructures for high‐energy x‐ray and particle imaging applications

N. M. Ceglio, G. F. Stone, A. M. Hawryluk
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 886–891 (1981)
https://doi.org/10.1116/1.571228
Published: November 1981
View article titled, Microstructures for high‐energy x‐ray and particle imaging applications
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