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Journal Articles

Laser diagnostics of plasma etching: Measurement of Cl+2 in a chlorine discharge

V. M. Donnelly, D. L. Flamm, G. Collins
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 817–823 (1982)
https://doi.org/10.1116/1.571829
Published: September 1982
View article titled, Laser diagnostics of plasma etching: Measurement of Cl<sup>+</sup><sub>2</sub> in a chlorine discharge
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Journal Articles

Simulation of plasma‐assisted etching processes by ion‐beam techniques

T. M. Mayer, R. A. Barker
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 757–763 (1982)
https://doi.org/10.1116/1.571821
Published: September 1982
View article titled, Simulation of plasma‐assisted etching processes by ion‐beam techniques
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Journal Articles

Plasma beam studies of Si and Al etching mechanisms

Donald L. Smith, Paul G. Saviano
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 768–773 (1982)
https://doi.org/10.1116/1.571823
Published: September 1982
View article titled, Plasma beam studies of Si and Al etching mechanisms
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Journal Articles

Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications

J. M. E. Harper, J. J. Cuomo, H. R. Kaufman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 737–756 (1982)
https://doi.org/10.1116/1.571820
Published: September 1982
View article titled, Technology and applications of broad‐beam ion sources used in sputtering. Part II. Applications
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Journal Articles

Dry development of ion beam exposed PMMA resist

I. Adesida, J. D. Chinn, L. Rathbun, E. D. Wolf
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 666–671 (1982)
https://doi.org/10.1116/1.571810
Published: July 1982
View article titled, Dry development of ion beam exposed PMMA resist
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Journal Articles

Reduction of surface states on GaAs by the plasma growth of oxyfluorides

R. K. Ahrenkiel, L. L. Kazmerski, P. J. Ireland, O. Jamjoum, P. E. Russell, D. Dunlavy, R. S. Wagner, S. Pattillo, T. Jervis
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 434–437 (1982)
https://doi.org/10.1116/1.571672
Published: July 1982
View article titled, Reduction of surface states on GaAs by the plasma growth of oxyfluorides
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Journal Articles

Indirect plasma deposition of silicon dioxide

L. G. Meiners
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 655–658 (1982)
https://doi.org/10.1116/1.571807
Published: July 1982
View article titled, Indirect plasma deposition of silicon dioxide
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Journal Articles

Columnar etching residue generation in reactive sputter etching of SiO2 and PSG

Y. Ozaki, K. Hirata
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 21, 61–65 (1982)
https://doi.org/10.1116/1.571737
Published: May 1982
View article titled, Columnar etching residue generation in reactive sputter etching of SiO<sub>2</sub> and PSG
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Journal Articles

Technology and applications of pumping fluids

L. Laurenson
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 989–995 (1982)
https://doi.org/10.1116/1.571660
Published: April 1982
View article titled, Technology and applications of pumping fluids
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Journal Articles

Reactive ion etching of aluminum using SiCl4

M. Sato, H. Nakamura
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 186–190 (1982)
https://doi.org/10.1116/1.571354
Published: February 1982
View article titled, Reactive ion etching of aluminum using SiCl<sub>4</sub>
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Journal Articles

Fabrication process for surface acoustic wave filters having 0.5 μm finger period electrodes

M. Itoh, H. Gokan, S. Esho, K. Asakawa
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 21–25 (1982)
https://doi.org/10.1116/1.571303
Published: January 1982
View article titled, Fabrication process for surface acoustic wave filters having 0.5 μm finger period electrodes
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Journal Articles

Hydrogen plasma etching of semiconductors and their oxides

R. P. H. Chang, C. C. Chang, S. Darack
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 45–50 (1982)
https://doi.org/10.1116/1.571307
Published: January 1982
View article titled, Hydrogen plasma etching of semiconductors and their oxides
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Journal Articles

Plasma pretreatment to improve resist properties by reduction of resist flow during postbake

J. M. Moran, G. N. Taylor
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1127–1131 (1981)
https://doi.org/10.1116/1.571182
Published: November 1981
View article titled, Plasma pretreatment to improve resist properties by reduction of resist flow during postbake
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Journal Articles

Plasma‐developed ion‐implanted resists with submicron resolution

T. Venkatesan, G. N. Taylor, A. Wagner, B. Wilkens, D. Barr
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 1379–1384 (1981)
https://doi.org/10.1116/1.571214
Published: November 1981
View article titled, Plasma‐developed ion‐implanted resists with submicron resolution
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Journal Articles

Electron‐beam fabrication of a 1.25 μm, 16‐bit I2L microprocessor

R. H. Havemann, R. L. Smith, S. A. Evans, L. A. Arledge, Jr., R.L. Love, G. L. Varnell
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 901–904 (1981)
https://doi.org/10.1116/1.571186
Published: November 1981
View article titled, Electron‐beam fabrication of a 1.25 μm, 16‐bit <em>I</em><sup>2</sup><em>L</em> microprocessor
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Journal Articles

Oxygen plasma etching of thick polymer layers

I. S. Goldstein, F. Kalk
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 743–747 (1981)
https://doi.org/10.1116/1.571143
Published: September 1981
View article titled, Oxygen plasma etching of thick polymer layers
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Journal Articles

Ultrasmooth plasma polymerized coatings for laser fusion targets

S. A. Letts, D. W. Myers, L. A. Witt
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 739–742 (1981)
https://doi.org/10.1116/1.571142
Published: September 1981
View article titled, Ultrasmooth plasma polymerized coatings for laser fusion targets
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Journal Articles

Pumping of corrosive or hazardous gases with turbomolecular and oil‐filled rotary vane backing pumps

K. Fischer, J. Henning, K. Abbel, H. Lotz
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1026–1029 (1981)
https://doi.org/10.1116/1.570878
Published: April 1981
View article titled, Pumping of corrosive or hazardous gases with turbomolecular and oil‐filled rotary vane backing pumps
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Journal Articles

Double‐shell inertial confinement fusion target fabrication

C. W. Hatcher, L. E. Lorensen, B. W. Weinstein
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1187–1190 (1981)
https://doi.org/10.1116/1.570868
Published: April 1981
View article titled, Double‐shell inertial confinement fusion target fabrication
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Journal Articles

Material and device research for VLSI in Japan

T. Sugano
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 804–809 (1981)
https://doi.org/10.1116/1.570952
Published: April 1981
View article titled, Material and device research for VLSI in Japan
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