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Journal Articles

Calculation of sputtering ion pump speed

W. Ho, R. K. Wang, T. P. Keng, K. H. Hu
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 1010–1013 (1982)
https://doi.org/10.1116/1.571529
Published: April 1982
View article titled, Calculation of sputtering ion pump speed
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Journal Articles

Effect of heat treatment on palladium amorphous silicon Schottky barriers

S. M. Pietruszko, K. L. Narasimhan, S. Guha
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 20, 801–803 (1982)
https://doi.org/10.1116/1.571488
Published: March 1982
View article titled, Effect of heat treatment on palladium amorphous silicon Schottky barriers
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Journal Articles

In situ seeding of high Z elements with glow discharge polymerized organic coatings

R. L. Crawley, L. B. Kool, R. L. Nolen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 1255–1257 (1981)
https://doi.org/10.1116/1.570907
Published: April 1981
View article titled, <em>I</em><em>n</em> <em>s</em><em>i</em><em>t</em><em>u</em> seeding of high Z elements with glow discharge polymerized organic coatings
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Journal Articles

Dependence of F atom density on pressure and flow rate in CF4 glow discharges as determined by emission spectroscopy

J. W. Coburn, M. Chen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 353–356 (1981)
https://doi.org/10.1116/1.570781
Published: March 1981
View article titled, Dependence of F atom density on pressure and flow rate in CF<sub>4</sub> glow discharges as determined by emission spectroscopy
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Journal Articles

Glow discharge mass spectrometry of sputtered tantalum nitride

C. R. Aita, T. A. Myers, W. J. LaRocca
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 324–327 (1981)
https://doi.org/10.1116/1.570751
Published: March 1981
View article titled, Glow discharge mass spectrometry of sputtered tantalum nitride
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Journal Articles

Emission spectroscopy of glow‐discharge and sputtering plasmas used in amorphous Si:H film deposition

M. A. Paesler, T. Okumura, W. Paul
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1332–1335 (1980)
https://doi.org/10.1116/1.570665
Published: November 1980
View article titled, Emission spectroscopy of glow‐discharge and sputtering plasmas used in amorphous Si:H film deposition
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Journal Articles

Phosphorus concentration in hydrogenated amorphous silicon using ion‐implanted references

J. H. Thomas, III
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1306–1308 (1980)
https://doi.org/10.1116/1.570660
Published: November 1980
View article titled, Phosphorus concentration in hydrogenated amorphous silicon using ion‐implanted references
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Journal Articles

A safer procedure to handle semiconductor devices in SEM examination

P. Lavallée
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 1254–1255 (1980)
https://doi.org/10.1116/1.570606
Published: September 1980
View article titled, A safer procedure to handle semiconductor devices in SEM examination
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Journal Articles

Aluminum nitride films by rf reactive ion‐plating

Yoichi Murayama, Kunihiro Kashiwagi, Masasi Kikuchi
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 796–799 (1980)
https://doi.org/10.1116/1.570562
Published: July 1980
View article titled, Aluminum nitride films by rf reactive ion‐plating
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Journal Articles

Discharge suppression within piezoelectric gas admission valves

A. J. McEvoy
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 854 (1980)
https://doi.org/10.1116/1.570576
Published: July 1980
View article titled, Discharge suppression within piezoelectric gas admission valves
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Journal Articles

Study of thin Nb oxide films

Pramod C. Karulkar, James E. Nordman
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 462–465 (1980)
https://doi.org/10.1116/1.570484
Published: January 1980
View article titled, Study of thin Nb oxide films
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Journal Articles

Measurements of the axial density profiles of sputtered cathode atoms in a dc glow discharge

Alwin Elbern
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1564–1568 (1979)
https://doi.org/10.1116/1.570249
Published: September 1979
View article titled, Measurements of the axial density profiles of sputtered cathode atoms in a dc glow discharge
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Journal Articles

Surface analysis of rf plasma oxidized In and PbInAu films using ESCA

John M. Baker, R. W. Johnson, R. A. Pollak
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1534–1541 (1979)
https://doi.org/10.1116/1.570243
Published: September 1979
View article titled, Surface analysis of rf plasma oxidized In and PbInAu films using ESCA
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Journal Articles

Vacuum system for national synchrotron light source

J. C. Schuchman, J. B. Godel, W. Jordan, T. Oversluizen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 720–723 (1979)
https://doi.org/10.1116/1.570067
Published: March 1979
View article titled, Vacuum system for national synchrotron light source
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Journal Articles

Interface composition and adhesion of glow‐discharge‐formed organo–tin polymers

Erich Kny, Leonard L. Levenson, William J. James, Robert A. Auerbach
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 359–362 (1979)
https://doi.org/10.1116/1.569950
Published: March 1979
View article titled, Interface composition and adhesion of glow‐discharge‐formed organo–tin polymers
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Journal Articles

Direct‐current glow discharge furnace for high‐rate carburzing

William L. Grube
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 335–338 (1979)
https://doi.org/10.1116/1.569943
Published: March 1979
View article titled, Direct‐current glow discharge furnace for high‐rate carburzing
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Journal Articles

Desorption of neutral molecules from Al(6061) by electron and ion bombardment

D. Edwards, Jr.
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 15, 1586–1596 (1978)
https://doi.org/10.1116/1.569815
Published: July 1978
View article titled, Desorption of neutral molecules from Al(6061) by electron and ion bombardment
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Journal Articles

Diagnostic methods for sputtering plasmas

John A. Thornton
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 15, 188–192 (1978)
https://doi.org/10.1116/1.569452
Published: March 1978
View article titled, Diagnostic methods for sputtering plasmas
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Journal Articles

Glow discharge processing versus bakeout for aluminum storage ring vacuum chambers

N. R. Dean, E. W. Hoyt, M. T. Palrang, B. G. Walker
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 15, 758–760 (1978)
https://doi.org/10.1116/1.569506
Published: March 1978
View article titled, Glow discharge processing versus bakeout for aluminum storage ring vacuum chambers
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Journal Articles

On the use of ring gap discharges for high‐rate vacuum coating

S. Schiller, U. Heisig, K. Goedicke
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 14, 815–818 (1977)
https://doi.org/10.1116/1.569273
Published: May 1977
View article titled, On the use of ring gap discharges for high‐rate vacuum coating
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