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Journal Articles

Electron‐beam fabrication of a 1.25 μm, 16‐bit I2L microprocessor

R. H. Havemann, R. L. Smith, S. A. Evans, L. A. Arledge, Jr., R.L. Love, G. L. Varnell
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 19, 901–904 (1981)
https://doi.org/10.1116/1.571186
Published: November 1981
View article titled, Electron‐beam fabrication of a 1.25 μm, 16‐bit <em>I</em><sup>2</sup><em>L</em> microprocessor
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Journal Articles

Control system dynamics using glow discharge mass spectroscopy for thin film sputtering

B. F. T. Bolker, T. C. Tisone, T. S. Latos
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 18, 328–334 (1981)
https://doi.org/10.1116/1.570752
Published: March 1981
View article titled, Control system dynamics using glow discharge mass spectroscopy for thin film sputtering
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Journal Articles

Closed loop control of thin film sputter deposition processes using glow discharge mass spectroscopy

T. C. Tisone, B. F. T. Bolker, T. S. Latos
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 17, 415–419 (1980)
https://doi.org/10.1116/1.570470
Published: January 1980
View article titled, Closed loop control of thin film sputter deposition processes using glow discharge mass spectroscopy
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Journal Articles

Direct device fabrication by selected area e‐beam annealing

R. A. McMahon, H. Ahmed
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 1840–1842 (1979)
https://doi.org/10.1116/1.570308
Published: November 1979
View article titled, Direct device fabrication by selected area <em>e</em>‐beam annealing
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Journal Articles

Pioneer Venus large probe neutral mass spectrometer

J. H. Hoffman, R. R. Hodges, K. D. Duerksen
Journal: Journal of Vacuum Science and Technology
J. Vac. Sci. Technol. 16, 692–694 (1979)
https://doi.org/10.1116/1.570059
Published: March 1979
View article titled, Pioneer Venus large probe neutral mass spectrometer
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