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Journal Articles

Chaos-enhanced self-adaptive particle swarm optimization with simulated annealing for digital lithography mask optimization

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Shengzhou Huang, Dongjie Wu, Yuanzhuo Tang, Bowen Ren, Jiani Pan, Zhaowei Tian, Yongkang Shao, Siwen He
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 012601 (2025)
https://doi.org/10.1116/6.0004107
Published: January 2025
View articletitled, Chaos-enhanced self-adaptive particle swarm optimization with simulated annealing for digital lithography mask optimization
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Journal Articles

Modification of discharge sequences to control the random dispersion of flake particles during wafer etching

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Ching Ming Ku, Wen Yea Jang, Stone Cheng
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064203 (2023)
https://doi.org/10.1116/6.0002974
Published: November 2023
View articletitled, Modification of discharge sequences to control the random dispersion of flake particles during wafer etching
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Journal Articles

Particle-in-cell simulation of an industrial magnetron with electron population analysis

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Andong Yue, Marcus Pearlman, Mike Worthington, John Cipolla, Jim Browning
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 022201 (2021)
https://doi.org/10.1116/6.0000809
Published: February 2021
View articletitled, Particle-in-cell simulation of an industrial magnetron with electron population analysis
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Journal Articles

Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas

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Ju-Ho Kim, Deuk-Chul Kwon, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 022801 (2020)
https://doi.org/10.1116/1.5133978
Published: March 2020
View articletitled, Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas
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Journal Articles

Simulation of microparticle motion and contamination in plasma coating systems

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Philipp Schulz, Andreas Pflug, Hans-Ulrich Kricheldorf
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 022203 (2020)
https://doi.org/10.1116/1.5130720
Published: January 2020
View articletitled, Simulation of microparticle motion and contamination in plasma coating systems
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Journal Articles

Experimental comparative analysis on series and parallel antenna in an inductively coupled plasma

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Tae-Woo Kim, Kyung-Hyun Kim, Moo-Young Lee, Chin-Wook Chung
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 062922 (2019)
https://doi.org/10.1116/1.5123543
Published: November 2019
View articletitled, Experimental comparative analysis on series and parallel antenna in an inductively coupled plasma
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Journal Articles

Characterization of the nature of shear-induced agglomerates as hard and soft in chemical mechanical polishing slurries

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Aniruddh J. Khanna, Feng-Chi Chang, Sushant Gupta, Purushottam Kumar, Rajiv K. Singh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 011207 (2019)
https://doi.org/10.1116/1.5065516
Published: January 2019
View articletitled, Characterization of the nature of shear-induced agglomerates as hard and soft in chemical mechanical polishing slurries
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Journal Articles

Development of ultralight nanocellulose magnets using ultrasonic agitation

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Derek T. Bradley, Eric Clausen, Paul M. Shand, Matthew Fleming, Timothy E. Kidd
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 061801 (2018)
https://doi.org/10.1116/1.5049814
Published: October 2018
View articletitled, Development of ultralight nanocellulose magnets using ultrasonic agitation
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Journal Articles

Image segmentation for uranium isotopic analysis by SIMS: Combined adaptive thresholding and marker controlled watershed approach

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David Willingham, Benjamin E. Naes, Patrick G. Heasler, Mindy M. Zimmer, Christopher A. Barrett, R. Shane Addleman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 03H106 (2016)
https://doi.org/10.1116/1.4940150
Published: January 2016
View articletitled, Image segmentation for uranium isotopic analysis by SIMS: Combined adaptive thresholding and marker controlled watershed approach
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Journal Articles

Visualization of beams from ionic liquid ion sources for focused ion beam applications

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Carla S. Perez-Martinez, Paulo C. Lozano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 30, 06F601 (2012)
https://doi.org/10.1116/1.4745187
Published: August 2012
View articletitled, Visualization of beams from ionic liquid ion sources for focused ion beam applications
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Journal Articles

Image noise in helium lithography

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Ananya Roy, Barry Craver, Leonidas E. Ocola, John C. Wolfe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 041005 (2011)
https://doi.org/10.1116/1.3597835
Published: August 2011
View articletitled, Image noise in helium lithography
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Journal Articles

Novel gun of rf power amplifier based on always-on cold cathode

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Qilong Wang, Yunsong Di, Wei Lei, Xiaobing Zhang, Jinchan Wang, Hui Mu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 646–650 (2007)
https://doi.org/10.1116/1.2715973
Published: March 2007
View articletitled, Novel gun of rf power amplifier based on always-on cold cathode
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Journal Articles

Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions

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Christof Asbach, Heinz Fissan, Jung Hyeun Kim, Se-Jin Yook, David Y. H. Pui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 47–53 (2007)
https://doi.org/10.1116/1.2404685
Published: December 2006
View articletitled, Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions
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Journal Articles

Microscopic approach to an equation for the heat flow between wafer and E-chuck

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Michael Klick, Mathias Bernt
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2509–2517 (2006)
https://doi.org/10.1116/1.2357745
Published: October 2006
View articletitled, Microscopic approach to an equation for the heat flow between wafer and E-chuck
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Journal Articles

Tunneling through MnAs particles at a GaAs p + n + junction

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F. L. Bloom, A. C. Young, R. C. Myers, E. R. Brown, A. C. Gossard, E. G. Gwinn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1639–1643 (2006)
https://doi.org/10.1116/1.2190680
Published: May 2006
View articletitled, Tunneling through MnAs particles at a GaAs p + n + junction
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Journal Articles

Full scale simulation of a field-emitter arrays based electron source for free-electron lasers

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M. Dehler, A. Candel, E. Gjonaj
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 892–897 (2006)
https://doi.org/10.1116/1.2181988
Published: March 2006
View articletitled, Full scale simulation of a field-emitter arrays based electron source for free-electron lasers
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Journal Articles

Narrow cone emission from negative electron affinity photocathodes

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Zhi Liu, Yun Sun, P. Pianetta, R. F. W. Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2758–2762 (2005)
https://doi.org/10.1116/1.2101726
Published: December 2005
View articletitled, Narrow cone emission from negative electron affinity photocathodes
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Journal Articles

Lithographically directed deposition of silica nanoparticles using spin coating

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Deying Xia, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3415–3420 (2004)
https://doi.org/10.1116/1.1821582
Published: December 2004
View articletitled, Lithographically directed deposition of silica nanoparticles using spin coating
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Journal Articles

Transition from sub-Poissonian to super-Poissonian shot noise in planar cold cathodes

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Rajesh Krishnan, Marc Cahay
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 21, 1278–1285 (2003)
https://doi.org/10.1116/1.1575251
Published: June 2003
View articletitled, Transition from sub-Poissonian to super-Poissonian shot noise in planar cold cathodes
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Journal Articles

Model etch profiles for ion energy distribution functions in an inductively coupled plasma reactor

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Wenjing Chen, Barbara Abraham-Shrauner, Joseph R. Woodworth
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 2061–2069 (1999)
https://doi.org/10.1116/1.590873
Published: September 1999
View articletitled, Model etch profiles for ion energy distribution functions in an inductively coupled plasma reactor
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