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Journal Articles

Fluorescent flow analysis of in situ material exchange in two-photon 3D printing

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Pratyaksh Yemulwar, Fatemeh Rajabasadi, Tanya Saxena, Man-Ho Wong, Josua Zscheile, Robert Kirchner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 43, 022602 (2025)
https://doi.org/10.1116/6.0004114
Published: February 2025
View articletitled, Fluorescent flow analysis of in situ material exchange in two-photon 3D printing
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Journal Articles

Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning

Editor’s PickOpen Access
Gulden Akcay, Jeroen van Venrooij, Regina Luttge
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 063001 (2024)
https://doi.org/10.1116/6.0003967
Published: November 2024
View articletitled, Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning
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Journal Articles

Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores

Editor’s PickAvailable to Purchase
Wen Chen, Soonmin Yim, Nestor J. Zaluzec, Gordon S. W. Craig, Seth B. Darling, Paul F. Nealey
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 062803 (2024)
https://doi.org/10.1116/6.0004050
Published: October 2024
View articletitled, Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores
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Journal Articles

Scalable fabrication of vertically arranged Bi2Se3 crossbar arrays for memristive device applications

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Seung jun Ki, Shiwoo Lee, Mingze Chen, Xiaogan Liang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 063203 (2024)
https://doi.org/10.1116/6.0004022
Published: October 2024
View articletitled, Scalable fabrication of vertically arranged Bi2Se3 crossbar arrays for memristive device applications
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Journal Articles

Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography

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Qi Wang, Kuibo Wang, Xiaobin Wu, Zixiang Gao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 052602 (2024)
https://doi.org/10.1116/6.0003791
Published: August 2024
View articletitled, Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography
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Journal Articles

Design of plasma strip chamber for uniform gas supply with fluid flow simulation

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Ji Won Jang, Se Yun Jo, Sang Jeen Hong
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 054201 (2024)
https://doi.org/10.1116/6.0003782
Published: July 2024
View articletitled, Design of plasma strip chamber for uniform gas supply with fluid flow simulation
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Journal Articles

Upgrading of the modified Knudsen equation and its verification for calculating the gas flow rate through cylindrical tubes

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Hajime Yoshida
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 044201 (2024)
https://doi.org/10.1116/6.0003581
Published: June 2024
View articletitled, Upgrading of the modified Knudsen equation and its verification for calculating the gas flow rate through cylindrical tubes
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Includes: Supplementary data
Journal Articles

Novel surface wave technique for moderate-pressure plasma measurements

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Shadhin Hussain, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034005 (2024)
https://doi.org/10.1116/6.0003331
Published: April 2024
View articletitled, Novel surface wave technique for moderate-pressure plasma measurements
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Journal Articles

Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials

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Michael J. Johnson, Gabriel H. Brown, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034004 (2024)
https://doi.org/10.1116/6.0003485
Published: April 2024
View articletitled, Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials
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Journal Articles

X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline

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Kanta Yamamoto, Yuichi Utsumi, Ikuya Sakurai, Ikuo Okada, Kenji Hanada, Hidehiro Ishizawa, Masahiro Takeo, Taki Watanabe, Sho Amano, Satoru Suzuki, Koji Sumitomo, Akinobu Yamaguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 062602 (2023)
https://doi.org/10.1116/6.0003021
Published: October 2023
View articletitled, X-ray multi-scale microfabrication system and x-ray imaging evaluation system all in one beamline
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Journal Articles

Heat-transfer modeling of the gas gap under a wafer

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E. Gonzalez-Juez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044206 (2023)
https://doi.org/10.1116/6.0002851
Published: July 2023
View articletitled, Heat-transfer modeling of the gas gap under a wafer
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Journal Articles

Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

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Kento Takenaka, Koji Takahara, Tomoki Eguchi, Hirosuke Sumida, Satoru Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044204 (2023)
https://doi.org/10.1116/6.0002662
Published: June 2023
View articletitled, Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy
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Journal Articles

Silicon etching by chlorine plasma: Validation of surface reactions mechanism

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Dmitry Levko, Laxminarayan L. Raja
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 042205 (2023)
https://doi.org/10.1116/6.0002608
Published: June 2023
View articletitled, Silicon etching by chlorine plasma: Validation of surface reactions mechanism
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Journal Articles

Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays

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Aixi Pan, Medhat Samaan, Zheng Yan, Wenhan Hu, Bo Cui
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 023001 (2023)
https://doi.org/10.1116/6.0002276
Published: January 2023
View articletitled, Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays
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Journal Articles

Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform

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Chao-Ching Chiang, Chan-Wen Chiu, Fan Ren, Cheng-Tse Tsai, Yu-Te Liao, Josephine F. Esquivel-Upshaw, Stephen J. Pearton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012204 (2023)
https://doi.org/10.1116/6.0002293
Published: December 2022
View articletitled, Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform
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Journal Articles

Pneumatic controlled nanosieve for efficient capture and release of nanoparticles

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Animesh Nanaware, Taylor Kranbuhl, Jesus Ching, Janice S. Chen, Xinye Chen, Qingsong Tu, Ke Du
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 063002 (2022)
https://doi.org/10.1116/6.0002107
Published: December 2022
View articletitled, Pneumatic controlled nanosieve for efficient capture and release of nanoparticles
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Includes: Supplementary data
Journal Articles

Diffusive separation in rarefied plume interaction

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J. Elin Vesper, Saša Kenjereš, Chris R. Kleijn
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 064202 (2022)
https://doi.org/10.1116/6.0002126
Published: November 2022
View articletitled, Diffusive separation in rarefied plume interaction
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Journal Articles

Design of the vacuum-centralized control system for the space plasma environment research facility based on the Experimental Physics and Industrial Control System

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Chenggang Jin, Yongqi Zhang, Wenbin Ling, Xinglin Yang, Jiangnan Cheng, Li Feng, Jie Wan, Huan Wang, Yaowen Lu, Liyi Li, Peng E.
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 044202 (2022)
https://doi.org/10.1116/6.0001931
Published: July 2022
View articletitled, Design of the vacuum-centralized control system for the space plasma environment research facility based on the Experimental Physics and Industrial Control System
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Journal Articles

Theoretical research on suppression ratio of dynamic gas lock for extreme ultraviolet lithography contamination control

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Jiazheng Sun, Kuibo Wang, Xiaobin Wu, Yan Luo, Jinbin Ding
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 042603 (2022)
https://doi.org/10.1116/6.0001852
Published: June 2022
View articletitled, Theoretical research on suppression ratio of dynamic gas lock for extreme ultraviolet lithography contamination control
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Journal Articles

Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma

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Shahid Rauf, Peng Tian, Jason Kenney, Leonid Dorf
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032202 (2022)
https://doi.org/10.1116/6.0001732
Published: April 2022
View articletitled, Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma
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