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Journal Articles

Characterization of porosity in periodic 3D nanostructures using spectroscopic scatterometry

Kwon Sang Lee, Kun-Chieh Chien, Barbara Groh, I-Te Chen, Michael Cullinan, Chih-Hao Chang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064001 (2023)
https://doi.org/10.1116/6.0003035
Published: October 2023
View article titled, Characterization of porosity in periodic 3D nanostructures using spectroscopic scatterometry
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Journal Articles

Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry

Madhulika Korde, Subhadeep Kal, Cheryl Alix, Nick Keller, G. Andrew Antonelli, Aelan Mosden, Alain C. Diebold
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 024007 (2020)
https://doi.org/10.1116/1.5136291
Published: March 2020
View article titled, Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry
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Journal Articles

Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication

Juan J. Faria-Briceno, Ruichao Zhu, Vineeth Sasidharan, Alexander Neumann, Shrawan Singhal, S. V. Sreenivasan, S. R. J. Brueck
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 052904 (2019)
https://doi.org/10.1116/1.5119707
Published: September 2019
View article titled, Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication
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Journal Articles

Scatterometry for nanoimprint lithography

Ruichao Zhu, Steven R. J. Brueck, Noel Dawson, Tito Busani, Praveen Joseph, Shrawan Singhal, S. V. Sreenivasan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06K503 (2016)
https://doi.org/10.1116/1.4967933
Published: November 2016
View article titled, Scatterometry for nanoimprint lithography
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Journal Articles

Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating

Tsuyoshi Amano, Tsukasa Abe
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FE02 (2015)
https://doi.org/10.1116/1.4931934
Published: September 2015
View article titled, Variation in phase defect size on extreme ultraviolet mask before and after reflective multilayer coating
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Journal Articles

Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction

Jinlong Zhu, Hao Jiang, Yating Shi, Chuanwei Zhang, Xiuguo Chen, Shiyuan Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 031807 (2015)
https://doi.org/10.1116/1.4919713
Published: May 2015
View article titled, Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction
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Journal Articles

Root-cause decomposition of line edge roughness and its application to cross-section profile prediction using top-view SEM images

Hiroshi Fukuda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F802 (2013)
https://doi.org/10.1116/1.4827187
Published: October 2013
View article titled, Root-cause decomposition of line edge roughness and its application to cross-section profile prediction using top-view SEM images
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Journal Articles

Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope

Tetsuo Harada, Yusuke Tanaka, Takeo Watanabe, Hiroo Kinoshita, Youichi Usui, Tsuyoshi Amano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F605 (2013)
https://doi.org/10.1116/1.4826249
Published: October 2013
View article titled, Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope
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Journal Articles

Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging

Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06F503 (2011)
https://doi.org/10.1116/1.3657525
Published: November 2011
View article titled, Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging
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Journal Articles

Scatterometric porosimetry: A new characterization technique for porous material patterned structures

R. Bouyssou, M. El Kodadi, C. Licitra, T. Chevolleau, M. Besacier, N. Posseme, O. Joubert, P. Schiavone
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, L31–L34 (2010)
https://doi.org/10.1116/1.3457489
Published: July 2010
View article titled, Scatterometric porosimetry: A new characterization technique for porous material patterned structures
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Journal Articles

Real time scatterometry for profile control during resist trimming process

M. El Kodadi, S. Soulan, M. Besacier, P. Schiavone
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3232–3237 (2009)
https://doi.org/10.1116/1.3256594
Published: December 2009
View article titled, Real time scatterometry for profile control during resist trimming process
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Journal Articles

Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging

James S. Clarke, Michael B. Schmidt, Ndubuisi G. Orji
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2526–2530 (2007)
https://doi.org/10.1116/1.2804516
Published: December 2007
View article titled, Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging
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Journal Articles

Surface characterization of imprinted resist above glass transition temperature

T. Lévéder, S. Landis, L. Davoust, S. Soulan, J.-H. Tortai, N. Chaix
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2365–2369 (2007)
https://doi.org/10.1116/1.2799975
Published: December 2007
View article titled, Surface characterization of imprinted resist above glass transition temperature
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Journal Articles

Nanoimprint lithography processes on 200 mm Si wafer for optical application: Residual thickness etching anisotropy

N. Chaix, C. Gourgon, C. Perret, S. Landis, T. Leveder
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2346–2351 (2007)
https://doi.org/10.1116/1.2801878
Published: December 2007
View article titled, Nanoimprint lithography processes on 200 mm Si wafer for optical application: Residual thickness etching anisotropy
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Journal Articles

Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

Rayan M. Al-Assaad, Suresh Regonda, Li Tao, Stella W. Pang, Wenchuang (Walter) Hu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2396–2401 (2007)
https://doi.org/10.1116/1.2800327
Published: December 2007
View article titled, Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry
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Journal Articles

Benchmarking of 50 nm features in thermal nanoimprint

C. Gourgon, N. Chaix, H. Schift, M. Tormen, S. Landis, C. M. Sotomayor Torres, A. Kristensen, R. H. Pedersen, M. B. Christiansen, I. Fernandez-Cuesta, D. Mendels, L. Montelius, T. Haatainen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2373–2378 (2007)
https://doi.org/10.1116/1.2794064
Published: December 2007
View article titled, Benchmarking of 50 nm features in thermal nanoimprint
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Journal Articles

Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon

H. Wang, G. M. Laws, S. Milicic, P. Boland, A. Handugan, M. Pratt, T. Eschrich, S. Myhajlenko, J. A. Allgair, B. Bunday
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 102–105 (2007)
https://doi.org/10.1116/1.2426976
Published: January 2007
View article titled, Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon
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Journal Articles

Measurement of residual thickness using scatterometry

David Fuard, Corinne Perret, Vincent Farys, Cécile Gourgon, Patrick Schiavone
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 3069–3074 (2005)
https://doi.org/10.1116/1.2130345
Published: December 2005
View article titled, Measurement of residual thickness using scatterometry
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Journal Articles

Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry

J. Perlich, F.-M. Kamm, J. Rau, F. Scholze, G. Ulm
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 3059–3062 (2004)
https://doi.org/10.1116/1.1809615
Published: December 2004
View article titled, Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry
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Journal Articles

Scatterometry measurement of sub-0.1 μm linewidth gratings

Stephen A. Coulombe, Babar K. Minhas, Christopher J. Raymond, S. Sohail H. Naqvi, John R. McNeil
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 80–87 (1998)
https://doi.org/10.1116/1.589840
Published: January 1998
View article titled, Scatterometry measurement of sub-0.1 μm linewidth gratings
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