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Journal Articles

Surface and functional characterization of nanostructured thin films for environmental remediation

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Enrica Maria Malannata, Alessandro Auditore, Antonino Licciardello
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044008 (2023)
https://doi.org/10.1116/6.0002611
Published: June 2023
View articletitled, Surface and functional characterization of nanostructured thin films for environmental remediation
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Includes: Supplementary data
Journal Articles

Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications

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Laurent Azarnouche, Stephen M. Sirard, William J. Durand, Gregory Blachut, Emir Gurer, Diane J. Hymes, Christopher J. Ellison, Carlton G. Willson, David B. Graves
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 061602 (2016)
https://doi.org/10.1116/1.4964885
Published: October 2016
View articletitled, Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications
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Includes: Supplementary data
Journal Articles

UV ozone passivation of the metal/dielectric interface for HfO 2 -based organic thin film transistors

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W. M. Tang, W. T. Ng, M. G. Helander, M. T. Greiner, Z. H. Lu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 1100–1103 (2010)
https://doi.org/10.1116/1.3498744
Published: October 2010
View articletitled, UV ozone passivation of the metal/dielectric interface for HfO 2 -based organic thin film transistors
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Journal Articles

Cs Br ∕ Ga N heterojunction photoelectron source

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Juan R. Maldonado, Zhi Liu, Yun Sun, Scott Schuetter, Piero Pianetta, R. F. W. Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2266–2270 (2007)
https://doi.org/10.1116/1.2779042
Published: December 2007
View articletitled, Cs Br ∕ Ga N heterojunction photoelectron source
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Journal Articles

Fabrication and material properties of NiTi nanofluid

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Ho Chang, Yi-Chun Hsu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 935–939 (2007)
https://doi.org/10.1116/1.2740286
Published: May 2007
View articletitled, Fabrication and material properties of NiTi nanofluid
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Journal Articles

Photoelectron emission studies in CsBr at 257 nm

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Juan R. Maldonado, Zhi Liu, Yun Sun, Piero A. Pianetta, Fabian W. Pease
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2886–2891 (2006)
https://doi.org/10.1116/1.2363410
Published: November 2006
View articletitled, Photoelectron emission studies in CsBr at 257 nm
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Journal Articles

Novel electron-beam-induced reaction of a sulfonium salt in the solid state

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Kazuyuki Enomoto, Seongyun Moon, Yasunari Maekawa, Junji Shimoyama, Kazuyuki Goto, Tadashi Narita, Masaru Yoshida
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 2337–2349 (2006)
https://doi.org/10.1116/1.2338046
Published: September 2006
View articletitled, Novel electron-beam-induced reaction of a sulfonium salt in the solid state
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Journal Articles

Effects of annealing treatment on microstructure and photocatalytic performance of nanostructured TiO 2 coatings through flame spraying with liquid feedstocks

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Guan-Jun Yang, Chang-Jiu Li, Feng Han, Xin-Chun Huang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2364–2368 (2004)
https://doi.org/10.1116/1.1788679
Published: October 2004
View articletitled, Effects of annealing treatment on microstructure and photocatalytic performance of nanostructured TiO 2 coatings through flame spraying with liquid feedstocks
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Journal Articles

Role of O ( 1 D) in the oxidation of Si(100)

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Tiffany Kaspar, Allan Tuan, Russell Tonkyn, Wayne P. Hess, J. W. Rogers, Jr., Yoshi Ono
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 21, 895–899 (2003)
https://doi.org/10.1116/1.1563254
Published: March 2003
View articletitled, Role of O ( 1 D) in the oxidation of Si(100)
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Journal Articles

Polymer photochemistry at advanced optical wavelengths

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Theodore H. Fedynyshyn, Roderick R. Kunz, Roger F. Sinta, Russell B. Goodman, Scott P. Doran
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 3332–3339 (2000)
https://doi.org/10.1116/1.1318186
Published: November 2000
View articletitled, Polymer photochemistry at advanced optical wavelengths
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Journal Articles

Modification of polymer surfaces and the fabrication of submicron‐scale functionalized structures by deep‐ultraviolet and electron‐beam lithography

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M. N. Wybourne, J. C. Wu, Mingdi Yan, Sui Xiong Cai, John F. W. Keana
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 11, 2210–2213 (1993)
https://doi.org/10.1116/1.586458
Published: November 1993
View articletitled, Modification of polymer surfaces and the fabrication of submicron‐scale functionalized structures by deep‐ultraviolet and electron‐beam lithography
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Journal Articles

Photoassisted organometallic vapor‐phase epitaxy of CdTe

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B. Liu, R. F. Hicks, J. J. Zinck, J. E. Jensen, G. L. Olson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 10, 1384–1391 (1992)
https://doi.org/10.1116/1.585873
Published: July 1992
View articletitled, Photoassisted organometallic vapor‐phase epitaxy of CdTe
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Journal Articles

Thermodynamics of the homogeneous and heterogeneous decomposition of trimethylaluminum, monomethylaluminum, and dimethylaluminumhydride: Effects of scavengers and ultraviolet‐laser photolysis

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J.‐O. Carlsson, S. Gorbatkin, D. Lubben, J. E. Greene
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 9, 2759–2770 (1991)
https://doi.org/10.1116/1.585642
Published: November 1991
View articletitled, Thermodynamics of the homogeneous and heterogeneous decomposition of trimethylaluminum, monomethylaluminum, and dimethylaluminumhydride: Effects of scavengers and ultraviolet‐laser photolysis
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Journal Articles

Polysilyne thin films as resists for deep ultraviolet lithography

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R. R. Kunz, M. W. Horn, R. B. Goodman, P. A. Bianconi, D. A. Smith, C. A. Freed
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 8, 1820–1825 (1990)
https://doi.org/10.1116/1.585166
Published: November 1990
View articletitled, Polysilyne thin films as resists for deep ultraviolet lithography
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Journal Articles

Reaction of silicon with chlorine and ultraviolet laser induced chemical etching mechanisms

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W. Sesselmann, E. Hudeczek, F. Bachmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1284–1294 (1989)
https://doi.org/10.1116/1.584474
Published: September 1989
View articletitled, Reaction of silicon with chlorine and ultraviolet laser induced chemical etching mechanisms
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Journal Articles

Ultraviolet photoetching of copper

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James H. Brannon, Karen W. Brannon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1275–1283 (1989)
https://doi.org/10.1116/1.584473
Published: September 1989
View articletitled, Ultraviolet photoetching of copper
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Journal Articles

Ultraviolet laser excited adsorbate–surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces

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T. J. Chuang, K. Domen
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 7, 1200–1207 (1989)
https://doi.org/10.1116/1.584572
Published: September 1989
View articletitled, Ultraviolet laser excited adsorbate–surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces
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Journal Articles

Reaction probability for the spontaneous etching of silicon by CF3 free radicals

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Robert M. Robertson, David M. Golden, Michel J. Rossi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 1632–1640 (1988)
https://doi.org/10.1116/1.584421
Published: November 1988
View articletitled, Reaction probability for the spontaneous etching of silicon by CF3 free radicals
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Journal Articles

Clearing resist from alignment mark areas using an excimer laser

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D. E. Seeger, M. G. Rosenfield
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 6, 399–402 (1988)
https://doi.org/10.1116/1.583962
Published: January 1988
View articletitled, Clearing resist from alignment mark areas using an excimer laser
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Journal Articles

Time‐resolved spectroscopic studies of the ultraviolet‐laser photolysis of Al alkyls for film growth

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D. Eres, T. Motooka, S. Gorbatkin, D. Lubben, J. E. Greene
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 5, 848–852 (1987)
https://doi.org/10.1116/1.583678
Published: July 1987
View articletitled, Time‐resolved spectroscopic studies of the ultraviolet‐laser photolysis of Al alkyls for film growth
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