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Journal Articles

Rapid prototyping of etch test structures for hard mask development using electron beam lithography

Barbara A. Kazanowska, Aaron M. Dangerfield, Han Wang, Gene Lee, Luisa D. Bozano
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 012601 (2024)
https://doi.org/10.1116/6.0003215
Published: January 2024
View article titled, Rapid prototyping of etch test structures for hard mask development using electron beam lithography
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Journal Articles

Modeling and algorithm of three-dimensional metrology with critical dimension scanning electron microscope

Delong Chen, Jielin Zhou, Yanjun Zhang, Erbo Xiao, Jinguo Ge, Quantong Li, Zhuming Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 064005 (2023)
https://doi.org/10.1116/6.0003012
Published: November 2023
View article titled, Modeling and algorithm of three-dimensional metrology with critical dimension scanning electron microscope
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Journal Articles

Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

Kento Takenaka, Koji Takahara, Tomoki Eguchi, Hirosuke Sumida, Satoru Suzuki
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 044204 (2023)
https://doi.org/10.1116/6.0002662
Published: June 2023
View article titled, Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy
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Journal Articles

Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)

Deepak Kumar, Krishnaroop Chaudhuri, Joseph W. Brill, Jonathan T. Pham, J. Todd Hastings
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 012604 (2023)
https://doi.org/10.1116/6.0002118
Published: January 2023
View article titled, Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)
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Journal Articles

Fabrication of sub-micrometer 3D structures for terahertz oscillators by electron beam gray-tone lithography

Editor’s Pick
Mikhail Bezhko, Safumi Suzuki, Shota Iino, Masahiro Asada
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 023206 (2022)
https://doi.org/10.1116/6.0001647
Published: February 2022
View article titled, Fabrication of sub-micrometer 3D structures for terahertz oscillators by electron beam gray-tone lithography
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Journal Articles

Shape and dose control for proximity effect correction on massively parallel electron-beam systems

Md Nabid Hasan, Soo-Young Lee, Byung-Sup Ahn, Jin Choi, Joon-Soo Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062603 (2020)
https://doi.org/10.1116/6.0000556
Published: October 2020
View article titled, Shape and dose control for proximity effect correction on massively parallel electron-beam systems
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Journal Articles

Effects of abnormal beams on writing qualities in massively-parallel e-beam systems

Md Nabid Hasan, Soo-Young Lee, Byung-Sup Ahn, Jin Choi, Seom-Beom Kim, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061609 (2019)
https://doi.org/10.1116/1.5121798
Published: November 2019
View article titled, Effects of abnormal beams on writing qualities in massively-parallel e-beam systems
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Journal Articles

Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography

Sergey Gorelick, Alex de Marco
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 051602 (2019)
https://doi.org/10.1116/1.5114948
Published: August 2019
View article titled, Self-aligned structures by a single-step through-membrane 100-keV electron beam lithography
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Journal Articles

Stochastic simulation of pattern formation in electron beam lithography

Masaaki Yasuda, Masanori Koyama, Masamitsu Shirai, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JA04 (2018)
https://doi.org/10.1116/1.5049757
Published: November 2018
View article titled, Stochastic simulation of pattern formation in electron beam lithography
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Journal Articles

Effects of stochastic exposure on critical dimension in electron-beam lithography

Hyesung Ji, Soo-Young Lee, Jin Choi, Seom-Beom Kim, In-Kyun Shin, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G503 (2017)
https://doi.org/10.1116/1.4995445
Published: October 2017
View article titled, Effects of stochastic exposure on critical dimension in electron-beam lithography
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Journal Articles

Adjustable sidewall slopes by electron-beam exposure layout

Editor’s Pick
Corinna Kaspar, Jörg Butschke, Mathias Irmscher, Stephan Martens, Holger Sailer, Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, Joachim N. Burghartz
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 06G501 (2017)
https://doi.org/10.1116/1.4993724
Published: August 2017
View article titled, Adjustable sidewall slopes by electron-beam exposure layout
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Journal Articles

Enhanced photocathode performance through optimization of film thickness and substrate

Anna Alexander, Nathan A. Moody, Prabhakar R. Bandaru
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 022202 (2017)
https://doi.org/10.1116/1.4976527
Published: February 2017
View article titled, Enhanced photocathode performance through optimization of film thickness and substrate
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Journal Articles

Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical dimension error

Rui Guo, Soo-Young Lee, Jin Choi, Sung-Hoon Park, In-Kyun Shin, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 011601 (2016)
https://doi.org/10.1116/1.4937740
Published: December 2015
View article titled, Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical dimension error
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Journal Articles

Analytic estimation and minimization of line edge roughness in electron-beam lithography

Rui Guo, Soo-Young Lee, Jin Choi, Sung-Hoon Park, In-Kyun Shin, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FD07 (2015)
https://doi.org/10.1116/1.4936070
Published: November 2015
View article titled, Analytic estimation and minimization of line edge roughness in electron-beam lithography
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Journal Articles

Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations

Masaaki Yasuda, Yuki Furukawa, Hiroaki Kawata, Yoshihiko Hirai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FH02 (2015)
https://doi.org/10.1116/1.4935956
Published: November 2015
View article titled, Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations
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Journal Articles

Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake

Hidetatsu Miyoshi, Jun Taniguchi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 06FD05 (2015)
https://doi.org/10.1116/1.4935558
Published: November 2015
View article titled, Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake
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Journal Articles

Tomographic measurement of buried interface roughness

Misa Hayashida, Shinichi Ogawa, Marek Malac
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 040605 (2015)
https://doi.org/10.1116/1.4926975
Published: July 2015
View article titled, Tomographic measurement of buried interface roughness
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Journal Articles

Hydrogen silsesquioxane on SOI proximity and microloading effects correction from a single 1D characterization sample

Justin R. Bickford, Gerald Lopez, Nikola Belic, Ulrich Hofmann
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F511 (2014)
https://doi.org/10.1116/1.4901567
Published: November 2014
View article titled, Hydrogen silsesquioxane on SOI proximity and microloading effects correction from a single 1D characterization sample
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Journal Articles

Experimental verification of achieving vertical sidewalls for nanoscale features in electron-beam lithography

Soo-Young Lee, Jin Choi, Sang-Hee Lee, In-Kyun Shin, Chan-Uk Jeon, Sang-Chul Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F510 (2014)
https://doi.org/10.1116/1.4901171
Published: November 2014
View article titled, Experimental verification of achieving vertical sidewalls for nanoscale features in electron-beam lithography
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Journal Articles

Determination and analysis of minimum dose for achieving vertical sidewall in electron-beam lithography

Xinyu Zhao, Qing Dai, Soo-Young Lee, Jin Choi, Sang-Hee Lee, In-Kyun Shin, Chan-Uk Jeon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F508 (2014)
https://doi.org/10.1116/1.4901013
Published: November 2014
View article titled, Determination and analysis of minimum dose for achieving vertical sidewall in electron-beam lithography
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