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Journal Articles

Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias

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Zhiying Chen, Joel Blakeney, Megan Carruth, Peter L. G. Ventzek, Alok Ranjan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 033601 (2022)
https://doi.org/10.1116/6.0001737
Published: April 2022
View articletitled, Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias
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Journal Articles

Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma

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Russell R. A. Callahan, Gregory B. Raupp, Stephen P. Beaudoin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 19, 725–731 (2001)
https://doi.org/10.1116/1.1366707
Published: May 2001
View articletitled, Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma
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Journal Articles

Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectrics

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M. R. Baklanov, S. Vanhaelemeersch, H. Bender, K. Maex
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 17, 372–379 (1999)
https://doi.org/10.1116/1.590660
Published: March 1999
View articletitled, Effects of oxygen and fluorine on the dry etch characteristics of organic low-k dielectrics
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Journal Articles

Surface processes occurring on TiSi 2 and CoSi 2 in fluorine-based plasmas: Afterglow of a NF 3 plasma

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M. R. Baklanov, S. Vanhaelemeersch, W. Storm, W. Vandervorst, K. Maex
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 164–172 (1998)
https://doi.org/10.1116/1.589773
Published: January 1998
View articletitled, Surface processes occurring on TiSi 2 and CoSi 2 in fluorine-based plasmas: Afterglow of a NF 3 plasma
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Journal Articles

Si1−xGex pulsed plasma etching using CHF3 and H2

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D. J. Paul, V. J. Law, G. A. C. Jones
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 13, 2234–2237 (1995)
https://doi.org/10.1116/1.588055
Published: November 1995
View articletitled, Si1−xGex pulsed plasma etching using CHF3 and H2
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Journal Articles

Investigation of modulated radio frequency plasma etching of GaAs using Langmuir probes

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V. J. Law, N. St. J. Braithwaite, S. G. Ingram, D. C. Clary, G. A. C. Jones
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 3337–3341 (1994)
https://doi.org/10.1116/1.587623
Published: November 1994
View articletitled, Investigation of modulated radio frequency plasma etching of GaAs using Langmuir probes
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