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Journal Articles

Influence of external circuitry on CF4 breakdown process in capacitively coupled plasma

Zhaoyu Chen, Jingwen Xu, Hongyu Wang, Hao Wu, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 053203 (2023)
https://doi.org/10.1116/5.0161552
Published: September 2023
View article titled, Influence of external circuitry on CF<sub>4</sub> breakdown process in capacitively coupled plasma
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Journal Articles

Novel excitation structure to improve the performance of a miniature radio frequency ion thruster

Wenjia Jiang, Liqiu Wei, Xinyong Yang, Zhou Yang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 040601 (2023)
https://doi.org/10.1116/6.0002753
Published: June 2023
View article titled, Novel excitation structure to improve the performance of a miniature radio frequency ion thruster
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Journal Articles

Design of a large nonevaporable getter pump for the full size ITER beam source prototype

E. Sartori, M. Siragusa, G. Berton, C. Cavallini, S. Dal Bello, M. Fadone, L. Grando, D. Marcuzzi, D. Rizzetto, G. Serianni, P. Sonato, M. Zaupa, F. Dinh, A. Ferrara, E. Maccallini, M. Mura, F. Siviero, V. Toigo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034202 (2023)
https://doi.org/10.1116/6.0002395
Published: April 2023
View article titled, Design of a large nonevaporable getter pump for the full size ITER beam source prototype
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Journal Articles

Impact of the growth environment in inductively coupled plasma on the synthesis and morphologies of carbon nanohorns

Fanny Casteignau, Taki Aissou, Jérôme Menneveux, Jocelyn Veilleux, Richard Martel, Nadi Braidy
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 062806 (2022)
https://doi.org/10.1116/6.0002134
Published: November 2022
View article titled, Impact of the growth environment in inductively coupled plasma on the synthesis and morphologies of carbon nanohorns
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Includes: Supplementary data
Journal Articles

Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]

David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 057001 (2022)
https://doi.org/10.1116/6.0002172
Published: September 2022
View article titled, Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]
Open the PDF for Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)] in another window
Journal Articles

Hollow cathode enhanced capacitively coupled plasmas in Ar/N2/H2 mixtures and implications for plasma enhanced ALD

David R. Boris, Michael J. Johnson, Charles R. Eddy, Jr., Scott G. Walton
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 044002 (2022)
https://doi.org/10.1116/6.0001840
Published: July 2022
View article titled, Hollow cathode enhanced capacitively coupled plasmas in Ar/N<sub>2</sub>/H<sub>2</sub> mixtures and implications for plasma enhanced ALD
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Journal Articles

Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma

Shahid Rauf, Peng Tian, Jason Kenney, Leonid Dorf
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 032202 (2022)
https://doi.org/10.1116/6.0001732
Published: April 2022
View article titled, Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma
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Journal Articles

Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning

Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun, Maxim Spiridonov, Dmitry Astakhov, Viacheslav Medvedev
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022601 (2022)
https://doi.org/10.1116/6.0001636
Published: March 2022
View article titled, Miniature plasma source for <em>in situ</em> extreme ultraviolet lithographic scanner cleaning
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Journal Articles

Plasma atomic layer etching for titanium nitride at low temperatures

Dahee Shim, Jihyun Kim, Yongjae Kim, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 022208 (2022)
https://doi.org/10.1116/6.0001602
Published: February 2022
View article titled, Plasma atomic layer etching for titanium nitride at low temperatures
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Journal Articles

Design of a remote plasma-enhanced chemical vapor deposition system for growth of tin containing group-IV alloys

Gordon Grzybowski, Morgan E. Ware, Arnold Kiefer, Bruce Claflin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 062209 (2020)
https://doi.org/10.1116/6.0000406
Published: November 2020
View article titled, Design of a remote plasma-enhanced chemical vapor deposition system for growth of tin containing group-IV alloys
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Journal Articles

Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source

Dren Qerimi, Gianluca Panici, Arihant Jain, Daniel Jacobson, David N. Ruzic
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 052601 (2020)
https://doi.org/10.1116/6.0000200
Published: August 2020
View article titled, Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source
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Journal Articles

Electron dynamics during the reignition of pulsed capacitively-coupled radio-frequency discharges

Keith Hernandez, Lawrence J. Overzet, Matthew J. Goeckner
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 034005 (2020)
https://doi.org/10.1116/1.5133790
Published: April 2020
View article titled, Electron dynamics during the reignition of pulsed capacitively-coupled radio-frequency discharges
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Journal Articles

Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate

Yasuhiro Isobe, Takayuki Sakai, Kyoichi Suguro, Naoto Miyashita, Hiroki Kondo, Kenji Ishikawa, Amalraj Frank Wilson, Naohiro Shimizu, Osamu Oda, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 061215 (2019)
https://doi.org/10.1116/1.5114831
Published: December 2019
View article titled, Simulation-aided design of very-high-frequency excited nitrogen plasma confinement using a shield plate
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Journal Articles

Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition

Yasuhiro Isobe, Takayuki Sakai, Naoharu Sugiyama, Ichiro Mizushima, Kyoichi Suguro, Naoto Miyashita, Yi Lu, Amalraj Frank Wilson, Dhasiyan Arun Kumar, Nobuyuki Ikarashi, Hiroki Kondo, Kenji Ishikawa, Naohiro Shimizu, Osamu Oda, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 031201 (2019)
https://doi.org/10.1116/1.5083970
Published: April 2019
View article titled, Effects of plasma shield plate design on epitaxial GaN films grown for large-sized wafers in radical-enhanced metalorganic chemical vapor deposition
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Journal Articles

Bacteria inactivation by atmospheric pressure plasma jet treatment

Matteo Pedroni, Stefano Morandi, Tiziana Silvetti, Anna Cremona, Giuseppe Gittini, Antonio Nardone, Fabrizio Pallotta, Milena Brasca, Espedito Vassallo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 01A107 (2018)
https://doi.org/10.1116/1.4995546
Published: December 2017
View article titled, Bacteria inactivation by atmospheric pressure plasma jet treatment
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Journal Articles

Growth of ordered and disordered ZnSnN2

Robert Allen Makin, Nancy Senabulya, James Mathis, N. Feldberg, P. Miska, Roy Clarke, Steven M. Durbin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 02B116 (2017)
https://doi.org/10.1116/1.4978021
Published: March 2017
View article titled, Growth of ordered and disordered ZnSnN<sub>2</sub>
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Journal Articles

Chemical downstream etching of Ge, Si, and SiNx films

M. David Henry, E. A. Douglas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 052003 (2016)
https://doi.org/10.1116/1.4961944
Published: August 2016
View article titled, Chemical downstream etching of Ge, Si, and SiN<sub>x</sub> films
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Journal Articles

Relationship between formation of surface-reaction layers and flux of dissociated species in C4F8/Ar plasma for SiO2 etching using pulsed-microwave plasma

Miyako Matsui, Tatehito Usui, Hisao Yasunami, Tetsuo Ono
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 051204 (2016)
https://doi.org/10.1116/1.4961456
Published: August 2016
View article titled, Relationship between formation of surface-reaction layers and flux of dissociated species in C<sub>4</sub>F<sub>8</sub>/Ar plasma for SiO<sub>2</sub> etching using pulsed-microwave plasma
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Journal Articles

Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling

Kenneth C. Johnson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041608 (2016)
https://doi.org/10.1116/1.4954988
Published: July 2016
View article titled, Extreme-ultraviolet plasma source with full, infrared to vacuum ultraviolet spectral filtering, and with power recycling
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Journal Articles

Growth of free-standing wurtzite AlGaN by MBE using a highly efficient RF plasma source

Sergei V. Novikov, Chris R. Staddon, Josh Whale, Anthony J. Kent, C. Thomas Foxon
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 02L102 (2016)
https://doi.org/10.1116/1.4940155
Published: January 2016
View article titled, Growth of free-standing wurtzite AlGaN by MBE using a highly efficient RF plasma source
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