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Journal Articles

Plasma confinement by an optoelectronic system

Editor’s Pick
Ryuta Tsukazaki (塚嵜 琉太), Haruhiro Naito (内藤 陽大), Hisashi Koga (古賀 永), Akito Fukuda (福田 旺土), Naoki Kato (加藤 直樹), Takayuki Watanabe (渡辺 貴之), Susumu Takabayashi (鷹林 将)
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 42, 034201 (2024)
https://doi.org/10.1116/6.0003520
Published: April 2024
View article titled, Plasma confinement by an optoelectronic system
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Includes: Supplementary data
Journal Articles

Influence of external circuitry on CF4 breakdown process in capacitively coupled plasma

Zhaoyu Chen, Jingwen Xu, Hongyu Wang, Hao Wu, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 053203 (2023)
https://doi.org/10.1116/5.0161552
Published: September 2023
View article titled, Influence of external circuitry on CF<sub>4</sub> breakdown process in capacitively coupled plasma
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Journal Articles

Deposition and morphology of direct current plasma-polymerized aniline

Sidney M. Palardonio, Magdaleno R. Vasquez, Jr.
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 41, 034201 (2023)
https://doi.org/10.1116/6.0002497
Published: March 2023
View article titled, Deposition and morphology of direct current plasma-polymerized aniline
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Journal Articles

Volatile vapor knife of immersion lithography hood using solutal Marangoni effect

Editor’s Pick
Junil Ryu, Gilgu Lee, Won Ki Lee, Jong Min Yoon, Namil Koo, Hyoungsoo Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 40, 052601 (2022)
https://doi.org/10.1116/5.0100753
Published: September 2022
View article titled, Volatile vapor knife of immersion lithography hood using solutal Marangoni effect
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Journal Articles

Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

William W. Hernández-Montero, Adrián Itzmoyotl-Toxqui, Carlos Zúñiga-Islas
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 39, 042203 (2021)
https://doi.org/10.1116/6.0001052
Published: July 2021
View article titled, Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings
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Includes: Supplementary data
Journal Articles

Influence of copper nanowires grown in a dielectric layer on the performance of dielectric barrier discharge

Zhao He, Zhihu Liang, Xiaoning Zhang, Chunliang Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 010603 (2017)
https://doi.org/10.1116/1.4973302
Published: December 2016
View article titled, Influence of copper nanowires grown in a dielectric layer on the performance of dielectric barrier discharge
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Journal Articles

Highly efficient initiation carrier injection for nonthermal atmospheric plasma generation

Youngmin Kim, Jaeyeong Park
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 062002 (2015)
https://doi.org/10.1116/1.4933043
Published: November 2015
View article titled, Highly efficient initiation carrier injection for nonthermal atmospheric plasma generation
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Journal Articles

Simulation studies of the dielectric layer effect on the discharge characteristics of the shadow mask plasma display panel

Panpan Zhang (张盼盼), Yan Tu (屠彦), Lanlan Yang (杨兰兰)
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 04E105 (2011)
https://doi.org/10.1116/1.3609249
Published: August 2011
View article titled, Simulation studies of the dielectric layer effect on the discharge characteristics of the shadow mask plasma display panel
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Journal Articles

Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma

R. L. Bruce, T. Lin, R. J. Phaneuf, G. S. Oehrlein, W. Bell, B. Long, C. G. Willson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, 751–757 (2010)
https://doi.org/10.1116/1.3455496
Published: July 2010
View article titled, Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
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Journal Articles

Patterning of alkanethiolate self-assembled monolayers by downstream microwave nitrogen plasma: Negative and positive resist behavior

Chih-Chiang Weng, Jiunn-Der Liao, Yi-Te Wu, Shih-Chun Tsai, Chia-Hao Chen, Michael Zharnikov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 1949–1957 (2009)
https://doi.org/10.1116/1.3167366
Published: July 2009
View article titled, Patterning of alkanethiolate self-assembled monolayers by downstream microwave nitrogen plasma: Negative and positive resist behavior
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Journal Articles

Electrical properties of nanotip-assisted microplasma devices

Sung-O. Kim, Yang-Suk Ko, Hal-Bon Gu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 193–197 (2009)
https://doi.org/10.1116/1.3043534
Published: February 2009
View article titled, Electrical properties of nanotip-assisted microplasma devices
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Journal Articles

Nitrogen and hydrogen plasma treatments of multiwalled carbon nanotubes

J. G. Jones, A. R. Waite, C. Muratore, A. A. Voevodin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 995–1000 (2008)
https://doi.org/10.1116/1.2917068
Published: May 2008
View article titled, Nitrogen and hydrogen plasma treatments of multiwalled carbon nanotubes
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Journal Articles

Comparative study on temperature-dependent characteristics of In P ∕ In Ga As single- and double-heterojunction bipolar transistors

Wei-Hsin Chen, Tzu-Pin Chen, Chi-Jhung Lee, Ching-Wen Hung, Kuei-Yi Chu, Li-Yang Chen, Tsung-Han Tsai, Wen-Chau Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 618–623 (2008)
https://doi.org/10.1116/1.2890707
Published: March 2008
View article titled, Comparative study on temperature-dependent characteristics of In P ∕ In Ga As single- and double-heterojunction bipolar transistors
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Journal Articles

Self-aligned microtriode for plasma generation at atmospheric pressure

S. H. Han, Y. M. Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 286–288 (2007)
https://doi.org/10.1116/1.2433968
Published: January 2007
View article titled, Self-aligned microtriode for plasma generation at atmospheric pressure
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Journal Articles

Effects of corona discharge ions on the synthesis of silver nanoparticles by a supersonic nozzle expansion method

Jae Hee Jung, Hyung Ho Park, Sang Soo Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 169–174 (2007)
https://doi.org/10.1116/1.2429670
Published: January 2007
View article titled, Effects of corona discharge ions on the synthesis of silver nanoparticles by a supersonic nozzle expansion method
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Journal Articles

Plasma implanted ultra shallow junction boron depth profiles: Effect of plasma chemistry and sheath conditions

Steve Walther, Ludovic Godet, Temel Büyüklimanli, John Weeman
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 489–493 (2006)
https://doi.org/10.1116/1.2137336
Published: January 2006
View article titled, Plasma implanted ultra shallow junction boron depth profiles: Effect of plasma chemistry and sheath conditions
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Journal Articles

Nanoscale layer etching by short-time exposure of substrates to gas discharges using moving patterned shutter

G. S. Oehrlein, X. Hua, C. Stolz, P. Jiang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 279–283 (2006)
https://doi.org/10.1116/1.2162570
Published: January 2006
View article titled, Nanoscale layer etching by short-time exposure of substrates to gas discharges using moving patterned shutter
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Journal Articles

Three-dimensional time-resolved analysis for the discharge of plasma display panel using the scanned-point detecting system

Hoon-Young Choi, Seok-Hyun Lee, Seung-Gol Lee, Jeong-Hyun Seo
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 612–617 (2005)
https://doi.org/10.1116/1.1861043
Published: April 2005
View article titled, Three-dimensional time-resolved analysis for the discharge of plasma display panel using the scanned-point detecting system
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Journal Articles

Temperature-dependent dc characteristics of an In Ga As ∕ In Ga As P heterojunction bipolar transistor with an InGaAsP spacer and a composite-collector structure

Jing-Yuh Chen, Chun-Yuan Chen, Kuan-Ming Lee, Chih-Hung Yen, Sheng-Fu Tsai, Shiou-Ying Cheng, Wen-Chau Liu
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2727–2733 (2004)
https://doi.org/10.1116/1.1807840
Published: November 2004
View article titled, Temperature-dependent dc characteristics of an In Ga As ∕ In Ga As P heterojunction bipolar transistor with an InGaAsP spacer and a composite-collector structure
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Journal Articles

Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks

Saurabh J. Ullal, Harmeet Singh, John Daugherty, Vahid Vahedi, Eray S. Aydil
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 20, 1939–1946 (2002)
https://doi.org/10.1116/1.1502698
Published: October 2002
View article titled, Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks
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