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Journal Articles

Diffusion of implanted Ge and Sn in β-Ga2O3

Ribhu Sharma, Mark E. Law, Minghan Xian, Marko Tadjer, Elaf A. Anber, Daniel Foley, Andrew C. Lang, James L. Hart, James Nathaniel, Mitra L. Taheri, Fan Ren, S. J. Pearton, A. Kuramata
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 051204 (2019)
https://doi.org/10.1116/1.5118001
Published: August 2019
View article titled, Diffusion of implanted Ge and Sn in β-Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Cryogenic etching of porous low-k dielectrics in CF3Br and CF4 plasmas

Askar Rezvanov, Andrey V. Miakonkikh, Alexey S. Vishnevskiy, Konstantin V. Rudenko, Mikhail R. Baklanov
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 35, 021204 (2017)
https://doi.org/10.1116/1.4975646
Published: February 2017
View article titled, Cryogenic etching of porous low-k dielectrics in CF<sub>3</sub>Br and CF<sub>4</sub> plasmas
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Journal Articles

Energetic Cs+ ion interaction with common microelectronic materials—An investigation of a future FIB candidate source

Yariv Drezner, Yuval Greenzweig, Amir Raveh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 061203 (2016)
https://doi.org/10.1116/1.4963896
Published: September 2016
View article titled, Energetic Cs<sup>+</sup> ion interaction with common microelectronic materials—An investigation of a future FIB candidate source
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Journal Articles

Crystal structure development of vanadium oxide thin films deposited by a magnetron sputtering technique

Alec Asadov, Surayya Mukhtar, Wei Gao
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 041802 (2015)
https://doi.org/10.1116/1.4922628
Published: June 2015
View article titled, Crystal structure development of vanadium oxide thin films deposited by a magnetron sputtering technique
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Journal Articles

Control of InGaAs and InAs facets using metal modulation epitaxy

Mark A. Wistey, Ashish K. Baraskar, Uttam Singisetti, Greg J. Burek, Byungha Shin, Eunji Kim, Paul C. McIntyre, Arthur C. Gossard, Mark J. W. Rodwell
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 011208 (2015)
https://doi.org/10.1116/1.4905497
Published: January 2015
View article titled, Control of InGaAs and InAs facets using metal modulation epitaxy
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Journal Articles

Influence of surface patterning on bacterial growth behavior

Peter Nill, Dieter P. Kern, Nadine Goehring, Andreas Peschel
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FA03 (2011)
https://doi.org/10.1116/1.3662084
Published: November 2011
View article titled, Influence of surface patterning on bacterial growth behavior
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Journal Articles

Transmission electron microscopy study of damage layer formed through ion beam induced deposition of platinum on silicon substrate

Byong Chon Park, Yun Chang Park, Hwack Joo Lee, Young Heon Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 28, C6F31–C6F37 (2010)
https://doi.org/10.1116/1.3516651
Published: December 2010
View article titled, Transmission electron microscopy study of damage layer formed through ion beam induced deposition of platinum on silicon substrate
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Journal Articles

Defectivity issues in topcoatless photoresists

Jason Cantone, Youri van Dommelen, Aiqin Jiang, Shannon Dunn, Tom Winter, Karen Petrillo, Rick Johnson, Peggy Lawson, Will Conley, Ryan Callahan
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3014–3019 (2009)
https://doi.org/10.1116/1.3253612
Published: December 2009
View article titled, Defectivity issues in topcoatless photoresists
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Journal Articles

Submillisecond post-exposure bake of chemically amplified resists by C O 2 laser spike annealing

Jing Sha, Byungki Jung, Michael O. Thompson, Christopher K. Ober, Manish Chandhok, Todd R. Younkin
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 3020–3024 (2009)
https://doi.org/10.1116/1.3263173
Published: December 2009
View article titled, Submillisecond post-exposure bake of chemically amplified resists by C O 2 laser spike annealing
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Journal Articles

Properties of ultralow energy boron implants using octadecaborane

M. S. Ameen, L. M. Rubin, M. A. Harris, C. Huynh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 373–376 (2008)
https://doi.org/10.1116/1.2790925
Published: January 2008
View article titled, Properties of ultralow energy boron implants using octadecaborane
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Journal Articles

Anomalous Mn depth profiles for Ga Mn As ∕ Ga As ( 001 ) thin films grown by molecular beam epitaxy

J. F. Xu, P. M. Thibado, C. Awo-Affouda, F. Ramos, V. P. LaBella
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 1476–1480 (2007)
https://doi.org/10.1116/1.2746351
Published: July 2007
View article titled, Anomalous Mn depth profiles for Ga Mn As ∕ Ga As ( 001 ) thin films grown by molecular beam epitaxy
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Journal Articles

Exposure dose effects on the reaction-diffusion process in model extreme ultraviolet photoresists

Kristopher A. Lavery, Bryan D. Vogt, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Kwang-Woo Choi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 3044–3047 (2006)
https://doi.org/10.1116/1.2375086
Published: November 2006
View article titled, Exposure dose effects on the reaction-diffusion process in model extreme ultraviolet photoresists
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Journal Articles

Study of diffusion and quality control for Co Si 2 formation by oxide-mediated cobalt silicidation with Ti capping

Juin-Jie Chang, Chuan-Pu Liu, Tsung-Eong Hsieh, Ying-Lang Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 1952–1955 (2005)
https://doi.org/10.1116/1.2006132
Published: September 2005
View article titled, Study of diffusion and quality control for Co Si 2 formation by oxide-mediated cobalt silicidation with Ti capping
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Journal Articles

Highly selective low-damage processes using advanced neutral beams for porous low- k films

Hiroto Ohtake, Nobuhiko Inoue, Takuya Ozaki, Seiji Samukawa, Eiichi Soda, Kazuaki Inukai
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 210–216 (2005)
https://doi.org/10.1116/1.1849219
Published: January 2005
View article titled, Highly selective low-damage processes using advanced neutral beams for porous low- k films
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Journal Articles

Direct Co Si 2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation

Juin-Jie Chang, Chuan-Pu Liu, Shih-Wei Chen, Chih-Chia Chang, Tsung-Eong Hsieh, Ying-Lang Wang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2299–2302 (2004)
https://doi.org/10.1116/1.1781660
Published: October 2004
View article titled, Direct Co Si 2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation
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Journal Articles

Growth of single crystalline GaN thin films on Si(111) substrates by high vacuum metalorganic chemical vapor deposition using a single molecular precursor

Sang Hun Lee, Jin-Hyo Boo, Sung Yong Lee, Seung Ho Yoo, Chang Gyoun Kim, Young Kuk Lee, Yunsoo Kim
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 22, 2144–2148 (2004)
https://doi.org/10.1116/1.1775193
Published: August 2004
View article titled, Growth of single crystalline GaN thin films on Si(111) substrates by high vacuum metalorganic chemical vapor deposition using a single molecular precursor
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Journal Articles

Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist

F. A. Houle, W. D. Hinsberg, M. Morrison, M. I. Sanchez, G. Wallraff, C. Larson, J. Hoffnagle
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 18, 1874–1885 (2000)
https://doi.org/10.1116/1.1303753
Published: July 2000
View article titled, Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
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Journal Articles

Roughness of thermal oxide layers grown on ion implanted silicon wafers

Fabio Iacona, Vito Raineri, Francesco La Via, Emanuele Rimini
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 16, 619–627 (1998)
https://doi.org/10.1116/1.590298
Published: March 1998
View article titled, Roughness of thermal oxide layers grown on ion implanted silicon wafers
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Journal Articles

Oxide growth on silicon (100) in the plasma phase of dry oxygen using an electron cyclotron resonance source

Keunjoo Kim, M. H. An, Y. G. Shin, M. S. Suh, C. J. Youn, Y. H. Lee, K. B. Lee, H. J. Lee
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 14, 2667–2673 (1996)
https://doi.org/10.1116/1.589002
Published: July 1996
View article titled, Oxide growth on silicon (100) in the plasma phase of dry oxygen using an electron cyclotron resonance source
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Journal Articles

Growth of iron on iron whiskers

Joseph A. Stroscio, D. T. Pierce
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 12, 1783–1788 (1994)
https://doi.org/10.1116/1.587599
Published: May 1994
View article titled, Growth of iron on iron whiskers
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