1-2 of 2
Chemically amplified molecular resist
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists

Free
Hannah Narcross, Brandon L. Sharp, Peter J. Ludovice, Laren M. Tolbert, Clifford L. Henderson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 06JC02 (2018)
https://doi.org/10.1116/1.5057442
Published: November 2018
View articletitled, Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists
Open the PDF for Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists in another window
Journal Articles

Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography

Available to Purchase
Hiroki Yamamoto, Seiichi Tagawa, Takahiro Kozawa, Hiroto Kudo, Kazumasa Okamoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 041606 (2016)
https://doi.org/10.1116/1.4953068
Published: June 2016
View articletitled, Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography
Open the PDF for Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography in another window