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Journal Articles

Photoassisted chemical smoothing of AlGaN surface after laser lift-off

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Zhongming Zheng, Hao Long, Samuel Matta, Mathieu Leroux, Julien Brault, Leiying Ying, Zhiwei Zheng, Baoping Zhang
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 38, 042207 (2020)
https://doi.org/10.1116/6.0000192
Published: July 2020
View articletitled, Photoassisted chemical smoothing of AlGaN surface after laser lift-off
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Journal Articles

Enhanced green luminescence from ZnO nanorods

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Emad H. H. Hasabeldaim, Odireleng M. Ntwaeaborwa, Robin E. Kroon, Elizabeth Coetsee, Hendrik C. Swart
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 37, 011201 (2019)
https://doi.org/10.1116/1.5052543
Published: January 2019
View articletitled, Enhanced green luminescence from ZnO nanorods
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Journal Articles

Temperature dependence of photoinduced hydrogen production and simultaneous separation in TiO2 nanotubes/palladium bilayer membrane

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Junki Asai, Kei Noda
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 36, 04H101 (2018)
https://doi.org/10.1116/1.5029281
Published: April 2018
View articletitled, Temperature dependence of photoinduced hydrogen production and simultaneous separation in TiO2 nanotubes/palladium bilayer membrane
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Journal Articles

Study of alternate hardmasks for extreme ultraviolet patterning

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Anuja De Silva, Indira Seshadri, Abraham Arceo, Karen Petrillo, Luciana Meli, Brock Mendoza, Yiping Yao, Michael Belyansky, Scott Halle, Nelson M. Felix
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 34, 06KG03 (2016)
https://doi.org/10.1116/1.4966960
Published: November 2016
View articletitled, Study of alternate hardmasks for extreme ultraviolet patterning
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Journal Articles

Synthesis of PbS/Cu2S/ZnS nanoparticles and their optical properties

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Thelma Serrano, Idalia Gómez
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 33, 02B111 (2015)
https://doi.org/10.1116/1.4906483
Published: February 2015
View articletitled, Synthesis of PbS/Cu2S/ZnS nanoparticles and their optical properties
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Journal Articles

Photoemission lifetime of a negative electron affinity gallium nitride photocathode

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Tomohiro Nishitani, Masao Tabuchi, Hiroshi Amano, Takuya Maekawa, Makoto Kuwahara, Takashi Meguro
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 06F901 (2014)
https://doi.org/10.1116/1.4901566
Published: November 2014
View articletitled, Photoemission lifetime of a negative electron affinity gallium nitride photocathode
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Journal Articles

Origin of external quantum efficiency degradation in organic light-emitting diodes with a DC magnetron sputtered cathode

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Hiroshi Fujimoto, Takuya Miyayama, Noriaki Sanada, Chihaya Adachi
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 32, 060603 (2014)
https://doi.org/10.1116/1.4897920
Published: October 2014
View articletitled, Origin of external quantum efficiency degradation in organic light-emitting diodes with a DC magnetron sputtered cathode
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Journal Articles

Stochastic exposure kinetics of extreme ultraviolet photoresists: Trapping model

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Chris A. Mack, John J. Biafore, Mark D. Smith
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 31, 06F603 (2013)
https://doi.org/10.1116/1.4823759
Published: October 2013
View articletitled, Stochastic exposure kinetics of extreme ultraviolet photoresists: Trapping model
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Journal Articles

Evaluation of three exposure schemes for absorbance-modulated interference lithography

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John E. Foulkes, Charles W. Holzwarth, Richard J. Blaikie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 29, 06FH01 (2011)
https://doi.org/10.1116/1.3640757
Published: September 2011
View articletitled, Evaluation of three exposure schemes for absorbance-modulated interference lithography
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Journal Articles

Influence of polarization on absorbance modulated subwavelength grating structures

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J. E. Foulkes, R. J. Blaikie
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 27, 2941–2946 (2009)
https://doi.org/10.1116/1.3237098
Published: December 2009
View articletitled, Influence of polarization on absorbance modulated subwavelength grating structures
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Journal Articles

Contributions of resist polymers to innate material roughness

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Theodore H. Fedynyshyn, David K. Astolfi, Russell B. Goodman, Susan Cann, Jeanette Roberts
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2281–2289 (2008)
https://doi.org/10.1116/1.2993259
Published: December 2008
View articletitled, Contributions of resist polymers to innate material roughness
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Journal Articles

Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise

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Christopher N. Anderson, Patrick P. Naulleau, Dimitra Niakoula, Elsayed Hassanein, Robert Brainard, Gregg Gallatin, Kim Dean
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 26, 2295–2299 (2008)
https://doi.org/10.1116/1.2968615
Published: December 2008
View articletitled, Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise
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Journal Articles

Measurements of acid generation by extreme ultraviolet irradiation in lithographic films

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Martin Glodde, Dario L. Goldfarb, David R. Medeiros, Gregory M. Wallraff, Gregory P. Denbeaux
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2496–2503 (2007)
https://doi.org/10.1116/1.2779045
Published: December 2007
View articletitled, Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
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Journal Articles

Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography

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Minoru Toriumi, Julius Santillan, Toshiro Itani, Takahiro Kozawa, Seiichi Tagawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 2486–2489 (2007)
https://doi.org/10.1116/1.2787850
Published: December 2007
View articletitled, Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography
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Journal Articles

Remarkably efficient acid generation in chemically amplified resist from quantum chemistry modeling

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Alex A. Granovsky, Anastasia V. Bochenkova, Nikolay Suetin, David Fryer, Vivek Singh
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 25, 58–68 (2007)
https://doi.org/10.1116/1.2406061
Published: January 2007
View articletitled, Remarkably efficient acid generation in chemically amplified resist from quantum chemistry modeling
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Journal Articles

Analysis of acid yield generated in chemically amplified electron beam resist

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Takahiro Kozawa, Takumi Shigaki, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 3055–3060 (2006)
https://doi.org/10.1116/1.2366656
Published: November 2006
View articletitled, Analysis of acid yield generated in chemically amplified electron beam resist
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Journal Articles

Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist

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Takahiro Kozawa, Seiichi Tagawa, Hiroaki Oizumi, Iwao Nishiyama
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, L27–L30 (2006)
https://doi.org/10.1116/1.2393297
Published: November 2006
View articletitled, Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist
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Journal Articles

Large area all-dielectric planar chiral metamaterials by electron beam lithography

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W. Zhang, A. Potts, D. M. Bagnall, B. R. Davidson
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 1455–1459 (2006)
https://doi.org/10.1116/1.2201454
Published: May 2006
View articletitled, Large area all-dielectric planar chiral metamaterials by electron beam lithography
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Journal Articles

Nanoseconds field emitted current pulses from ZrC needles and field emitter arrays

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R. Ganter, R. J. Bakker, R. Betemps, M. Dehler, T. Gerber, J. Gobrecht, C. Gough, M. Johnson, E. Kirk, G. Knopp, F. Le Pimpec, K. Li, M. Paraliev, M. Pedrozzi, L. Rivkin, H. Sehr, L. Schulz, A. Wrulich
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 24, 974–978 (2006)
https://doi.org/10.1116/1.2174025
Published: March 2006
View articletitled, Nanoseconds field emitted current pulses from ZrC needles and field emitter arrays
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Journal Articles

Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation

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Yuichi Utsumi, Takefumi Kishimoto
Journal: Journal of Vacuum Science & Technology B
J. Vac. Sci. Technol. B 23, 2903–2909 (2005)
https://doi.org/10.1116/1.2131880
Published: December 2005
View articletitled, Large area and wide dimension range x-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation
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